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Title: Unraveling the Role of Order-to-Disorder Transition in Shear Thickening Suspensions

Journal Article · · Physical Review Letters
 [1];  [1];  [1];  [1];  [1];  [2]
  1. Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
  2. Argonne National Lab. (ANL), Argonne, IL (United States). Center for Nanoscale Materials

Using high resolution in situ small angle x-ray scattering in conjunction with oscillatory shear on highly monodisperse silica suspensions, we demonstrate that an order-to-disorder transition leads to a dynamic shear thickening in a lower stress regime than the standard steady shear thickening. We show that the order-to-disorder transition is controlled by strain, which is distinguishably different from steady shear thickening which is a stress related phenomenon. The appearance of this two-step shear thinning and thickening transition is also influenced by particle size, monodispersity and measurement conditions (i.e. oscillatory shear vs. steady shear). Our results show definitively that the order-to-disorder transition induced thickening is completely unrelated to the mechanism that drives the steady shear thickening.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF)
Grant/Contract Number:
AC02-06CH11357
OSTI ID:
1427548
Alternate ID(s):
OSTI ID: 1416226
Journal Information:
Physical Review Letters, Vol. 120, Issue 2; ISSN 0031-9007
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 14 works
Citation information provided by
Web of Science

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Figures / Tables (5)