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Title: On production and asymmetric focusing of flat electron beams using rectangular capillary discharge plasmas

Abstract

A method for the asymmetric focusing of electron bunches, based on the active plasma lensing technique is proposed. Our method takes advantage of the strong inhomogeneous magnetic field generated inside the capillary discharge plasma to focus the ultrarelativistic electrons. The plasma and magnetic field parameters inside the capillary discharge are described theoretically and modeled with dissipative magnetohydrodynamic computer simulations enabling analysis of the capillaries of rectangle cross-sections. We could use large aspect ratio rectangular capillaries to transport electron beams with high emittance asymmetries, as well as assist in forming spatially flat electron bunches for final focusing before the interaction point.

Authors:
 [1];  [2]; ORCiD logo [1];  [2];  [2];  [1];  [3];  [3]; ORCiD logo [3];  [3];  [3];  [3];  [3];  [4];  [4];  [4];  [5];  [6]
  1. Russian Academy of Sciences (RAS), Moscow (Russian Federation). Keldysh Inst. of Applied Mathematics; National Research Nuclear Univ., Moscow (Russian Federation). Moscow Engineering Physics Inst.
  2. Russian Academy of Sciences (RAS), Moscow (Russian Federation). Keldysh Inst. of Applied Mathematics
  3. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
  4. Academy of Sciences of the Czech Republic (ASCR), Prague (Czech Republic). Inst. of Physics
  5. National Inst. for Quantum and Radiological Science and Technology (QST), Kyoto (Japan). Kansai Photon Science Inst.
  6. Academy of Sciences of the Czech Republic (ASCR), Prague (Czech Republic). Inst. of Physics; National Inst. for Quantum and Radiological Science and Technology (QST), Kyoto (Japan). Kansai Photon Science Inst.; AM Prokhorov General Physics Inst., Moscow (Russian Federation)
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), High Energy Physics (HEP) (SC-25)
OSTI Identifier:
1415977
Alternate Identifier(s):
OSTI ID: 1414983
Grant/Contract Number:  
AC02-05CH11231
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Volume: 24; Journal Issue: 12; Journal ID: ISSN 1070-664X
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; electron beams; particle acceleration; magnetohydrodynamics; computer simulation; electronic structure

Citation Formats

Bagdasarov, G. A., Bobrova, N. A., Boldarev, A. S., Olkhovskaya, O. G., Sasorov, P. V., Gasilov, V. A., Barber, S. K., Bulanov, S. S., Gonsalves, A. J., Schroeder, C. B., van Tilborg, J., Esarey, E., Leemans, W. P., Levato, T., Margarone, D., Korn, G., Kando, M., and Bulanov, S. V. On production and asymmetric focusing of flat electron beams using rectangular capillary discharge plasmas. United States: N. p., 2017. Web. doi:10.1063/1.5009118.
Bagdasarov, G. A., Bobrova, N. A., Boldarev, A. S., Olkhovskaya, O. G., Sasorov, P. V., Gasilov, V. A., Barber, S. K., Bulanov, S. S., Gonsalves, A. J., Schroeder, C. B., van Tilborg, J., Esarey, E., Leemans, W. P., Levato, T., Margarone, D., Korn, G., Kando, M., & Bulanov, S. V. On production and asymmetric focusing of flat electron beams using rectangular capillary discharge plasmas. United States. doi:10.1063/1.5009118.
Bagdasarov, G. A., Bobrova, N. A., Boldarev, A. S., Olkhovskaya, O. G., Sasorov, P. V., Gasilov, V. A., Barber, S. K., Bulanov, S. S., Gonsalves, A. J., Schroeder, C. B., van Tilborg, J., Esarey, E., Leemans, W. P., Levato, T., Margarone, D., Korn, G., Kando, M., and Bulanov, S. V. Wed . "On production and asymmetric focusing of flat electron beams using rectangular capillary discharge plasmas". United States. doi:10.1063/1.5009118.
@article{osti_1415977,
title = {On production and asymmetric focusing of flat electron beams using rectangular capillary discharge plasmas},
author = {Bagdasarov, G. A. and Bobrova, N. A. and Boldarev, A. S. and Olkhovskaya, O. G. and Sasorov, P. V. and Gasilov, V. A. and Barber, S. K. and Bulanov, S. S. and Gonsalves, A. J. and Schroeder, C. B. and van Tilborg, J. and Esarey, E. and Leemans, W. P. and Levato, T. and Margarone, D. and Korn, G. and Kando, M. and Bulanov, S. V.},
abstractNote = {A method for the asymmetric focusing of electron bunches, based on the active plasma lensing technique is proposed. Our method takes advantage of the strong inhomogeneous magnetic field generated inside the capillary discharge plasma to focus the ultrarelativistic electrons. The plasma and magnetic field parameters inside the capillary discharge are described theoretically and modeled with dissipative magnetohydrodynamic computer simulations enabling analysis of the capillaries of rectangle cross-sections. We could use large aspect ratio rectangular capillaries to transport electron beams with high emittance asymmetries, as well as assist in forming spatially flat electron bunches for final focusing before the interaction point.},
doi = {10.1063/1.5009118},
journal = {Physics of Plasmas},
number = 12,
volume = 24,
place = {United States},
year = {Wed Dec 27 00:00:00 EST 2017},
month = {Wed Dec 27 00:00:00 EST 2017}
}

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Works referenced in this record:

A Z-Pinch Plasma Lens for Focusing High-Energy Particles in an Accelerator
journal, January 1987

  • Autin, B.; Riege, H.; Boggasch, E.
  • IEEE Transactions on Plasma Science, Vol. 15, Issue 2, p. 226-237
  • DOI: 10.1109/TPS.1987.4316689