Atomic layer deposition of molybdenum disulfide films using MoF 6 and H 2 S

Mane, Anil U.; Letourneau, Steven; Mandia, David J.; Liu, Jian; Libera, Joseph A.; Lei, Yu; Peng, Qing; Graugnard, Elton; Elam, Jeffrey W.

doi:10.1116/1.5003423

Title: Atomic layer deposition of molybdenum disulfide films using MoF ₆ and H ₂ S

Journal Article · Mon Jan 01 00:00:00 EST 2018 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/1.5003423· OSTI ID:1415157

Mane, Anil U. ^[1]; Letourneau, Steven ^[2]; Mandia, David J. ^[1]; Liu, Jian ^[3]; Libera, Joseph A. ^[1]; Lei, Yu ^[1]; Peng, Qing ^[1]; Graugnard, Elton ^[4]; Elam, Jeffrey W. ^[5]

Energy Systems Division, Argonne National Laboratory, 9700 S. Cass Ave., Argonne, Illinois 60439
Micron School of Materials Science and Engineering, Boise State University, 1910 University Dr., Boise, Idaho 83725
Department of Chemistry, Northwestern University, 2145 Sheridan Rd., Evanston, Illinois 60208
Micron School of Materials Science and Engineering, Boise State University, 1910 University Dr., Boise Idaho 83725
Energy Systems Division, Argonne National Laboratory, 9700 S. Cass Ave, Argonne, Illinois 60439

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Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-06CH11357; SC0014664

OSTI ID:: 1415157

Journal Information:: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Vol. 36 Journal Issue: 1; ISSN 0734-2101

Publisher:: American Vacuum SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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