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Title: Role of the dense amorphous carbon layer in photoresist etching

Authors:
 [1];  [2];  [2];  [3];  [1]
  1. Department of Materials Science and Engineering, Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20742
  2. Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742
  3. Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742, Institute for Physical Science and Technology, University of Maryland, College Park, Maryland 20742, and Center for Nanophysics and Advanced Materials, University of Maryland, College Park, Maryland 20742
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1414017
Grant/Contract Number:
SC0001939
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 2; Related Information: CHORUS Timestamp: 2018-02-14 20:19:05; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Pranda, Adam, Gutierrez Razo, Sandra A., Tomova, Zuleykhan, Fourkas, John T., and Oehrlein, Gottlieb S. Role of the dense amorphous carbon layer in photoresist etching. United States: N. p., 2018. Web. doi:10.1116/1.5009640.
Pranda, Adam, Gutierrez Razo, Sandra A., Tomova, Zuleykhan, Fourkas, John T., & Oehrlein, Gottlieb S. Role of the dense amorphous carbon layer in photoresist etching. United States. doi:10.1116/1.5009640.
Pranda, Adam, Gutierrez Razo, Sandra A., Tomova, Zuleykhan, Fourkas, John T., and Oehrlein, Gottlieb S. Thu . "Role of the dense amorphous carbon layer in photoresist etching". United States. doi:10.1116/1.5009640.
@article{osti_1414017,
title = {Role of the dense amorphous carbon layer in photoresist etching},
author = {Pranda, Adam and Gutierrez Razo, Sandra A. and Tomova, Zuleykhan and Fourkas, John T. and Oehrlein, Gottlieb S.},
abstractNote = {},
doi = {10.1116/1.5009640},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 2,
volume = 36,
place = {United States},
year = {Thu Mar 01 00:00:00 EST 2018},
month = {Thu Mar 01 00:00:00 EST 2018}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on December 19, 2018
Publisher's Accepted Manuscript

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