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Title: Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl 2 plasma

Authors:
 [1];  [2];  [1];  [2];  [1];  [2];  [1]
  1. Department of Physics and Center for Accelerator Science, Old Dominion University, Norfolk, VA 23529, USA
  2. Thomas Jefferson National Accelerator Facility, Newport News, VA 23606, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1414016
Grant/Contract Number:
SC0014397
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
AIP Advances
Additional Journal Information:
Journal Volume: 7; Journal Issue: 12; Related Information: CHORUS Timestamp: 2017-12-19 08:24:08; Journal ID: ISSN 2158-3226
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Upadhyay, J., Palczewski, A., Popović, S., Valente-Feliciano, A. -M., Im, Do, Phillips, H. L., and Vušković, L. Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl 2 plasma. United States: N. p., 2017. Web. doi:10.1063/1.4991888.
Upadhyay, J., Palczewski, A., Popović, S., Valente-Feliciano, A. -M., Im, Do, Phillips, H. L., & Vušković, L. Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl 2 plasma. United States. doi:10.1063/1.4991888.
Upadhyay, J., Palczewski, A., Popović, S., Valente-Feliciano, A. -M., Im, Do, Phillips, H. L., and Vušković, L. Fri . "Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl 2 plasma". United States. doi:10.1063/1.4991888.
@article{osti_1414016,
title = {Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl 2 plasma},
author = {Upadhyay, J. and Palczewski, A. and Popović, S. and Valente-Feliciano, A. -M. and Im, Do and Phillips, H. L. and Vušković, L.},
abstractNote = {},
doi = {10.1063/1.4991888},
journal = {AIP Advances},
number = 12,
volume = 7,
place = {United States},
year = {Fri Dec 01 00:00:00 EST 2017},
month = {Fri Dec 01 00:00:00 EST 2017}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1063/1.4991888

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