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Title: Irreversible metal-insulator transition in thin film VO 2 induced by soft X-ray irradiation

Authors:
ORCiD logo [1];  [2];  [3]; ORCiD logo [4];  [5];  [3];  [6]
  1. Department of Physics, Boston University, Boston, Massachusetts 02215, USA, Department of Physics, Central University of Kashmir, Srinagar, Jammu And Kashmir 190004, India
  2. School of Chemical Sciences and The MacDiarmid Institute for Advanced Materials and Nanotechnology, The University of Auckland, Auckland 92019, New Zealand
  3. Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, California 92093, USA
  4. Department of Physics and Center for Advanced Nanoscience, University of California San Diego, La Jolla, California 92093, USA, Department of Physics, Universidad de los Andes, Bogot√° 111711, Colombia
  5. Department of Physics, Boston University, Boston, Massachusetts 02215, USA
  6. Department of Physics, Boston University, Boston, Massachusetts 02215, USA, School of Chemical Sciences and The MacDiarmid Institute for Advanced Materials and Nanotechnology, The University of Auckland, Auckland 92019, New Zealand
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1413073
Grant/Contract Number:  
AC02-05CH11231; FG02-98ER45680
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 111 Journal Issue: 24; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Singh, V. R., Jovic, V., Valmianski, I., Ramirez, J. G., Lamoureux, B., Schuller, Ivan K., and Smith, K. E. Irreversible metal-insulator transition in thin film VO 2 induced by soft X-ray irradiation. United States: N. p., 2017. Web. doi:10.1063/1.5012940.
Singh, V. R., Jovic, V., Valmianski, I., Ramirez, J. G., Lamoureux, B., Schuller, Ivan K., & Smith, K. E. Irreversible metal-insulator transition in thin film VO 2 induced by soft X-ray irradiation. United States. doi:10.1063/1.5012940.
Singh, V. R., Jovic, V., Valmianski, I., Ramirez, J. G., Lamoureux, B., Schuller, Ivan K., and Smith, K. E. Mon . "Irreversible metal-insulator transition in thin film VO 2 induced by soft X-ray irradiation". United States. doi:10.1063/1.5012940.
@article{osti_1413073,
title = {Irreversible metal-insulator transition in thin film VO 2 induced by soft X-ray irradiation},
author = {Singh, V. R. and Jovic, V. and Valmianski, I. and Ramirez, J. G. and Lamoureux, B. and Schuller, Ivan K. and Smith, K. E.},
abstractNote = {},
doi = {10.1063/1.5012940},
journal = {Applied Physics Letters},
number = 24,
volume = 111,
place = {United States},
year = {Mon Dec 11 00:00:00 EST 2017},
month = {Mon Dec 11 00:00:00 EST 2017}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on December 13, 2018
Publisher's Accepted Manuscript

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Works referenced in this record:

Metal-insulator transition in vanadium dioxide
journal, June 1975