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Title: Stability of Residual Oxides in Oxide-Derived Copper Catalysts for Electrochemical CO 2 Reduction Investigated with 18 O Labeling

Authors:
ORCiD logo [1]; ORCiD logo [1]
  1. Joint Center for Artificial Photosynthesis and Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley CA 94720 USA, Department of Materials Science and Engineering, University of California, Berkeley CA 94720 USA
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1412579
Grant/Contract Number:
SC0004993
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Angewandte Chemie
Additional Journal Information:
Journal Volume: 130; Journal Issue: 2; Related Information: CHORUS Timestamp: 2018-01-12 14:36:41; Journal ID: ISSN 0044-8249
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Lum, Yanwei, and Ager, Joel W. Stability of Residual Oxides in Oxide-Derived Copper Catalysts for Electrochemical CO 2 Reduction Investigated with 18 O Labeling. Germany: N. p., 2017. Web. doi:10.1002/ange.201710590.
Lum, Yanwei, & Ager, Joel W. Stability of Residual Oxides in Oxide-Derived Copper Catalysts for Electrochemical CO 2 Reduction Investigated with 18 O Labeling. Germany. doi:10.1002/ange.201710590.
Lum, Yanwei, and Ager, Joel W. Fri . "Stability of Residual Oxides in Oxide-Derived Copper Catalysts for Electrochemical CO 2 Reduction Investigated with 18 O Labeling". Germany. doi:10.1002/ange.201710590.
@article{osti_1412579,
title = {Stability of Residual Oxides in Oxide-Derived Copper Catalysts for Electrochemical CO 2 Reduction Investigated with 18 O Labeling},
author = {Lum, Yanwei and Ager, Joel W.},
abstractNote = {},
doi = {10.1002/ange.201710590},
journal = {Angewandte Chemie},
number = 2,
volume = 130,
place = {Germany},
year = {Fri Dec 08 00:00:00 EST 2017},
month = {Fri Dec 08 00:00:00 EST 2017}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on December 8, 2018
Publisher's Accepted Manuscript

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