Metallic dielectric photonic crystals and methods of fabrication
Patent
·
OSTI ID:1411388
A metallic-dielectric photonic crystal is formed with a periodic structure defining a plurality of resonant cavities to selectively absorb incident radiation. A metal layer is deposited on the inner surfaces of the resonant cavities and a dielectric material fills inside the resonant cavities. This photonic crystal can be used to selectively absorb broadband solar radiation and then reemit absorbed radiation in a wavelength band that matches the absorption band of a photovoltaic cell. The photonic crystal can be fabricated by patterning a sacrificial layer with a plurality of holes, into which is deposited a supporting material. Removing the rest of the sacrificial layer creates a supporting structure, on which a layer of metal is deposited to define resonant cavities. A dielectric material then fills the cavities to form the photonic crystal.
- Research Organization:
- Massachusetts Institute of Technology, Cambridge, MA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- SC0001299; SC0001299
- Assignee:
- Massachusetts Institute of Technology (Cambridge, MA)
- Patent Number(s):
- 9,837,953
- Application Number:
- 15/343,030
- OSTI ID:
- 1411388
- Country of Publication:
- United States
- Language:
- English
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