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Title: Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition

Authors:
 [1];  [2]; ORCiD logo [3];  [3];  [4];  [3]; ORCiD logo [1]
  1. Peter A. Rock Thermochemistry Laboratory and NEAT ORU, University of California Davis, Davis California
  2. Peter A. Rock Thermochemistry Laboratory and NEAT ORU, University of California Davis, Davis California, State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an China
  3. Department of Chemistry and Biochemistry, Brigham Young University, Provo Utah
  4. Logic Technology Development, Intel Corporation, Hillsboro Oregon
Publication Date:
Sponsoring Org.:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
OSTI Identifier:
1411087
Grant/Contract Number:
SC0016446
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Journal of the American Ceramic Society
Additional Journal Information:
Journal Volume: 101; Journal Issue: 5; Related Information: CHORUS Timestamp: 2018-03-02 06:15:02; Journal ID: ISSN 0002-7820
Publisher:
Wiley-Blackwell
Country of Publication:
United States
Language:
English

Citation Formats

Chen, Jiewei, Niu, Min, Calvin, Jason, Asplund, Megan, King, Sean W., Woodfield, Brian F., and Navrotsky, Alexandra. Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition. United States: N. p., 2017. Web. doi:10.1111/jace.15350.
Chen, Jiewei, Niu, Min, Calvin, Jason, Asplund, Megan, King, Sean W., Woodfield, Brian F., & Navrotsky, Alexandra. Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition. United States. doi:10.1111/jace.15350.
Chen, Jiewei, Niu, Min, Calvin, Jason, Asplund, Megan, King, Sean W., Woodfield, Brian F., and Navrotsky, Alexandra. Fri . "Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition". United States. doi:10.1111/jace.15350.
@article{osti_1411087,
title = {Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition},
author = {Chen, Jiewei and Niu, Min and Calvin, Jason and Asplund, Megan and King, Sean W. and Woodfield, Brian F. and Navrotsky, Alexandra},
abstractNote = {},
doi = {10.1111/jace.15350},
journal = {Journal of the American Ceramic Society},
number = 5,
volume = 101,
place = {United States},
year = {Fri Dec 01 00:00:00 EST 2017},
month = {Fri Dec 01 00:00:00 EST 2017}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on December 1, 2018
Publisher's Accepted Manuscript

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