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Title: Freestanding NiFe Oxyfluoride Holey Film with Ultrahigh Volumetric Capacitance for Flexible Asymmetric Supercapacitors

Authors:
 [1];  [1];  [2];  [3];  [4];  [4];  [2];  [5]; ORCiD logo [6]
  1. NanoScience Technology Center, University of Central Florida, Orlando FL 32826 USA
  2. Physical and Computational Sciences Directorate, Pacific Northwest National Laboratory, Richland WA 99352 USA
  3. Department of Materials Science and Engineering, University of Central Florida, Orlando FL 32826 USA
  4. Department of Mechanical and Aerospace Engineering, University of Central Florida, Orlando FL 32816 USA
  5. Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland WA 99352 USA
  6. NanoScience Technology Center, University of Central Florida, Orlando FL 32826 USA, Department of Materials Science and Engineering, University of Central Florida, Orlando FL 32826 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1408786
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Small
Additional Journal Information:
Journal Volume: 14; Journal Issue: 3; Related Information: CHORUS Timestamp: 2018-01-18 09:28:20; Journal ID: ISSN 1613-6810
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Liang, Kun, Marcus, Kyle, Yang, Zhenzhong, Zhou, Le, Pan, Hao, Bai, Yuanli, Du, Yingge, Engelhard, Mark H., and Yang, Yang. Freestanding NiFe Oxyfluoride Holey Film with Ultrahigh Volumetric Capacitance for Flexible Asymmetric Supercapacitors. Germany: N. p., 2017. Web. doi:10.1002/smll.201702295.
Liang, Kun, Marcus, Kyle, Yang, Zhenzhong, Zhou, Le, Pan, Hao, Bai, Yuanli, Du, Yingge, Engelhard, Mark H., & Yang, Yang. Freestanding NiFe Oxyfluoride Holey Film with Ultrahigh Volumetric Capacitance for Flexible Asymmetric Supercapacitors. Germany. doi:10.1002/smll.201702295.
Liang, Kun, Marcus, Kyle, Yang, Zhenzhong, Zhou, Le, Pan, Hao, Bai, Yuanli, Du, Yingge, Engelhard, Mark H., and Yang, Yang. Tue . "Freestanding NiFe Oxyfluoride Holey Film with Ultrahigh Volumetric Capacitance for Flexible Asymmetric Supercapacitors". Germany. doi:10.1002/smll.201702295.
@article{osti_1408786,
title = {Freestanding NiFe Oxyfluoride Holey Film with Ultrahigh Volumetric Capacitance for Flexible Asymmetric Supercapacitors},
author = {Liang, Kun and Marcus, Kyle and Yang, Zhenzhong and Zhou, Le and Pan, Hao and Bai, Yuanli and Du, Yingge and Engelhard, Mark H. and Yang, Yang},
abstractNote = {},
doi = {10.1002/smll.201702295},
journal = {Small},
number = 3,
volume = 14,
place = {Germany},
year = {Tue Nov 14 00:00:00 EST 2017},
month = {Tue Nov 14 00:00:00 EST 2017}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on November 14, 2018
Publisher's Accepted Manuscript

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