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Title: Microlens Array Laser Transverse Shaping Technique for Photoemission Electron Source

Abstract

A common issue encountered in photoemission electron sources used in electron accelerators is distortion of the laser spot due to non ideal conditions at all stages of the amplification. Such a laser spot at the cathode may produce asymmetric charged beams that will result in degradation of the beam quality due to space charge at early stages of acceleration and fail to optimally utilize the cathode surface. In this note we study the possibility of using microlens arrays to dramatically improve the transverse uniformity of the drive laser pulse on UV photocathodes at both Fermilab Accelerator Science \& Technology (FAST) facility and Argonne Wakefield Accelerator (AWA). In particular, we discuss the experimental characterization of the homogeneity and periodic patterned formation at the photocathode. Finally, we compare the experimental results with the paraxial analysis, ray tracing and wavefront propagation software.

Authors:
 [1];  [2];  [3];  [4];  [4];  [1];  [4];  [5];  [5];  [5]
  1. Northern Illinois Univ., DeKalb, IL (United States); Fermi National Accelerator Lab. (FNAL), Batavia, IL (United States)
  2. Argonne National Lab. (ANL), Argonne, IL (United States); Pohang Univ. of Science and Technology (POSTECH) (Korea, Republic of)
  3. Argonne National Lab. (ANL), Argonne, IL (United States); Tsinghua Univ., Beijing (China)
  4. Argonne National Lab. (ANL), Argonne, IL (United States)
  5. Fermi National Accelerator Lab. (FNAL), Batavia, IL (United States)
Publication Date:
Research Org.:
Fermi National Accelerator Lab. (FNAL), Batavia, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), High Energy Physics (HEP) (SC-25)
OSTI Identifier:
1408329
Report Number(s):
FERMILAB-TM-2634-APC; arXiv:1609.01661
1485409; TRN: US1800531
DOE Contract Number:
AC02-07CH11359
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; PHOTOCATHODES; WAKEFIELD ACCELERATORS; ELECTRON SOURCES; PHOTOEMISSION

Citation Formats

Halavanau, A., Ha, G., Qiang, G., Gai, W., Power, J., Piot, P., Wisniewski, E., Edstrom, D., Ruan, J., and Santucci, J.. Microlens Array Laser Transverse Shaping Technique for Photoemission Electron Source. United States: N. p., 2016. Web. doi:10.2172/1408329.
Halavanau, A., Ha, G., Qiang, G., Gai, W., Power, J., Piot, P., Wisniewski, E., Edstrom, D., Ruan, J., & Santucci, J.. Microlens Array Laser Transverse Shaping Technique for Photoemission Electron Source. United States. doi:10.2172/1408329.
Halavanau, A., Ha, G., Qiang, G., Gai, W., Power, J., Piot, P., Wisniewski, E., Edstrom, D., Ruan, J., and Santucci, J.. Tue . "Microlens Array Laser Transverse Shaping Technique for Photoemission Electron Source". United States. doi:10.2172/1408329. https://www.osti.gov/servlets/purl/1408329.
@article{osti_1408329,
title = {Microlens Array Laser Transverse Shaping Technique for Photoemission Electron Source},
author = {Halavanau, A. and Ha, G. and Qiang, G. and Gai, W. and Power, J. and Piot, P. and Wisniewski, E. and Edstrom, D. and Ruan, J. and Santucci, J.},
abstractNote = {A common issue encountered in photoemission electron sources used in electron accelerators is distortion of the laser spot due to non ideal conditions at all stages of the amplification. Such a laser spot at the cathode may produce asymmetric charged beams that will result in degradation of the beam quality due to space charge at early stages of acceleration and fail to optimally utilize the cathode surface. In this note we study the possibility of using microlens arrays to dramatically improve the transverse uniformity of the drive laser pulse on UV photocathodes at both Fermilab Accelerator Science \& Technology (FAST) facility and Argonne Wakefield Accelerator (AWA). In particular, we discuss the experimental characterization of the homogeneity and periodic patterned formation at the photocathode. Finally, we compare the experimental results with the paraxial analysis, ray tracing and wavefront propagation software.},
doi = {10.2172/1408329},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Sep 06 00:00:00 EDT 2016},
month = {Tue Sep 06 00:00:00 EDT 2016}
}

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