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Title: Sub-10 nm patterning with DNA nanostructures: a short perspective

Abstract

DNA is the hereditary material that contains our unique genetic code. Since the first demonstration of two-dimensional (2D) nanopatterns by using designed DNA origami ~10 years ago, DNA has evolved into a novel technique for 2D and 3D nanopatterning. It is now being used as a template for the creation of sub-10 nm structures via either 'top-down' or 'bottom-up' approaches for various applications spanning from nanoelectronics, plasmonic sensing, and nanophotonics. This paper starts with an histroric overview and discusses the current state-of-the-art in DNA nanolithography. Finally, emphasis is put on the challenges and prospects of DNA nanolithography as the next generation nanomanufacturing technique.

Authors:
ORCiD logo [1];  [1]; ORCiD logo [2];  [3];  [4]
  1. Univ. of California, Berkeley, CA (United States). Dept. of Chemistry
  2. Stevens Inst. of Technology, Hoboken, NJ (United States). Dept. of Mechanical Engineering
  3. IBM T.J. Watson Research Center, Yorktown Heights, NY (United States). Dept. of Science and Solutions
  4. Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials
Publication Date:
Research Org.:
Univ. of California, Berkeley, CA (United States); Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1407469
Report Number(s):
BNL-114447-2017-JA
Journal ID: ISSN 0957-4484; KC0403020
Grant/Contract Number:  
SC0012704
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Nanotechnology
Additional Journal Information:
Journal Volume: 28; Journal Issue: 44; Journal ID: ISSN 0957-4484
Publisher:
IOP Publishing
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; DNA nanostructure; nanolithography; sub-10 nm; nanomanufacturing

Citation Formats

Du, Ke, Park, Myeongkee, Ding, Junjun, Hu, Huan, and Zhang, Zheng. Sub-10 nm patterning with DNA nanostructures: a short perspective. United States: N. p., 2017. Web. doi:10.1088/1361-6528/aa8a28.
Du, Ke, Park, Myeongkee, Ding, Junjun, Hu, Huan, & Zhang, Zheng. Sub-10 nm patterning with DNA nanostructures: a short perspective. United States. doi:10.1088/1361-6528/aa8a28.
Du, Ke, Park, Myeongkee, Ding, Junjun, Hu, Huan, and Zhang, Zheng. Mon . "Sub-10 nm patterning with DNA nanostructures: a short perspective". United States. doi:10.1088/1361-6528/aa8a28. https://www.osti.gov/servlets/purl/1407469.
@article{osti_1407469,
title = {Sub-10 nm patterning with DNA nanostructures: a short perspective},
author = {Du, Ke and Park, Myeongkee and Ding, Junjun and Hu, Huan and Zhang, Zheng},
abstractNote = {DNA is the hereditary material that contains our unique genetic code. Since the first demonstration of two-dimensional (2D) nanopatterns by using designed DNA origami ~10 years ago, DNA has evolved into a novel technique for 2D and 3D nanopatterning. It is now being used as a template for the creation of sub-10 nm structures via either 'top-down' or 'bottom-up' approaches for various applications spanning from nanoelectronics, plasmonic sensing, and nanophotonics. This paper starts with an histroric overview and discusses the current state-of-the-art in DNA nanolithography. Finally, emphasis is put on the challenges and prospects of DNA nanolithography as the next generation nanomanufacturing technique.},
doi = {10.1088/1361-6528/aa8a28},
journal = {Nanotechnology},
number = 44,
volume = 28,
place = {United States},
year = {Mon Sep 04 00:00:00 EDT 2017},
month = {Mon Sep 04 00:00:00 EDT 2017}
}

Journal Article:
Free Publicly Available Full Text
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Cited by: 2 works
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