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Title: Emittance preservation in plasma-based accelerators with ion motion

Abstract

In a plasma-accelerator-based linear collider, the density of matched, low-emittance, high-energy particle bunches required for collider applications can be orders of magnitude above the background ion density, leading to ion motion, perturbation of the focusing fields, and, hence, to beam emittance growth. By analyzing the response of the background ions to an ultrahigh density beam, analytical expressions, valid for nonrelativistic ion motion, are derived for the transverse wakefield and for the final (i.e., after saturation) bunch emittance. Analytical results are validated against numerical modeling. Initial beam distributions are derived that are equilibrium solutions, which require head-to-tail bunch shaping, enabling emittance preservation with ion motion.

Authors:
 [1];  [1];  [1];  [1]
  1. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), High Energy Physics (HEP) (SC-25)
OSTI Identifier:
1406398
Alternate Identifier(s):
OSTI ID: 1421839
Grant/Contract Number:  
AC02-05CH11231
Resource Type:
Journal Article: Published Article
Journal Name:
Physical Review Accelerators and Beams
Additional Journal Information:
Journal Volume: 20; Journal Issue: 11; Journal ID: ISSN 2469-9888
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS

Citation Formats

Benedetti, C., Schroeder, C. B., Esarey, E., and Leemans, W. P.. Emittance preservation in plasma-based accelerators with ion motion. United States: N. p., 2017. Web. doi:10.1103/PhysRevAccelBeams.20.111301.
Benedetti, C., Schroeder, C. B., Esarey, E., & Leemans, W. P.. Emittance preservation in plasma-based accelerators with ion motion. United States. doi:10.1103/PhysRevAccelBeams.20.111301.
Benedetti, C., Schroeder, C. B., Esarey, E., and Leemans, W. P.. Wed . "Emittance preservation in plasma-based accelerators with ion motion". United States. doi:10.1103/PhysRevAccelBeams.20.111301.
@article{osti_1406398,
title = {Emittance preservation in plasma-based accelerators with ion motion},
author = {Benedetti, C. and Schroeder, C. B. and Esarey, E. and Leemans, W. P.},
abstractNote = {In a plasma-accelerator-based linear collider, the density of matched, low-emittance, high-energy particle bunches required for collider applications can be orders of magnitude above the background ion density, leading to ion motion, perturbation of the focusing fields, and, hence, to beam emittance growth. By analyzing the response of the background ions to an ultrahigh density beam, analytical expressions, valid for nonrelativistic ion motion, are derived for the transverse wakefield and for the final (i.e., after saturation) bunch emittance. Analytical results are validated against numerical modeling. Initial beam distributions are derived that are equilibrium solutions, which require head-to-tail bunch shaping, enabling emittance preservation with ion motion.},
doi = {10.1103/PhysRevAccelBeams.20.111301},
journal = {Physical Review Accelerators and Beams},
number = 11,
volume = 20,
place = {United States},
year = {Wed Nov 01 00:00:00 EDT 2017},
month = {Wed Nov 01 00:00:00 EDT 2017}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1103/PhysRevAccelBeams.20.111301

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