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Title: Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications

Authors:
 [1];  [2]
  1. University of Kentucky, Center for Applied Energy Research, 40511 Lexington, KY USA
  2. Stevens Institute of Technology, Department of Chemical Engineering and Materials Science, Castle Point on Hudson 07030 Hoboken, NJ USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1404753
Grant/Contract Number:
SC0012704
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Fuel Cells
Additional Journal Information:
Journal Volume: 17; Journal Issue: 6; Related Information: CHORUS Timestamp: 2017-12-14 09:44:04; Journal ID: ISSN 1615-6846
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Omosebi, A., and Besser, R. S.. Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications. Germany: N. p., 2017. Web. doi:10.1002/fuce.201600183.
Omosebi, A., & Besser, R. S.. Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications. Germany. doi:10.1002/fuce.201600183.
Omosebi, A., and Besser, R. S.. 2017. "Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications". Germany. doi:10.1002/fuce.201600183.
@article{osti_1404753,
title = {Ultra-low Mass Sputtered and Conventional Catalyst Layers on Plasma-etched Nafion for PEMFC Applications},
author = {Omosebi, A. and Besser, R. S.},
abstractNote = {},
doi = {10.1002/fuce.201600183},
journal = {Fuel Cells},
number = 6,
volume = 17,
place = {Germany},
year = 2017,
month =
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on October 25, 2018
Publisher's Accepted Manuscript

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