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Title: Strain-free polished channel-cut crystal monochromators: a new approach and results

Abstract

The use of channel-cut crystal monochromators has been traditionally limited to applications that can tolerate the rough surface quality from wet etching without polishing. We have previously presented and discussed the motivation for producing channel cut crystals with strain-free polished surfaces [1]. Afterwards, we have undertaken an effort to design and implement an automated machine for polishing channel-cut crystals. The initial effort led to inefficient results. Since then, we conceptualized, designed, and implemented a new version of the channel-cut polishing machine, now called C-CHiRP (Channel-Cut High Resolution Polisher), also known as CCPM V2.0. The new machine design no longer utilizes Figure-8 motion that mimics manual polishing. Instead, the polishing is achieved by a combination of rotary and linear functions of two coordinated motion systems. Here we present the new design of C-CHiRP, its capabilities and features. Multiple channel-cut crystals polished using the C-CHiRP have been deployed into several beamlines at the Advanced Photon Source (APS). We present the measurements of surface finish, flatness, as well as topography results obtained at 1-BM of APS, as compared with results typically achieved when polishing flat-surface monochromator crystals using conventional polishing processes. Limitations of the current machine design, capabilities and considerations for strain-free polishingmore » of highly complex crystals are also discussed, together with an outlook for future developments and improvements.« less

Authors:
; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
Argonne National Laboratory - Advanced Photon Source
OSTI Identifier:
1402059
DOE Contract Number:
AC02-06CH11357
Resource Type:
Conference
Resource Relation:
Conference: 2017 SPIE Optics + Photonics Conference, 08/06/17 - 08/10/17, San Diego, CA, US
Country of Publication:
United States
Language:
English

Citation Formats

Kasman, Elina, Montgomery, Jonathan, Huang, XianRong, and Assoufid, Lahsen. Strain-free polished channel-cut crystal monochromators: a new approach and results. United States: N. p., 2017. Web. doi:10.1117/12.2277605.
Kasman, Elina, Montgomery, Jonathan, Huang, XianRong, & Assoufid, Lahsen. Strain-free polished channel-cut crystal monochromators: a new approach and results. United States. doi:10.1117/12.2277605.
Kasman, Elina, Montgomery, Jonathan, Huang, XianRong, and Assoufid, Lahsen. Wed . "Strain-free polished channel-cut crystal monochromators: a new approach and results". United States. doi:10.1117/12.2277605.
@article{osti_1402059,
title = {Strain-free polished channel-cut crystal monochromators: a new approach and results},
author = {Kasman, Elina and Montgomery, Jonathan and Huang, XianRong and Assoufid, Lahsen},
abstractNote = {The use of channel-cut crystal monochromators has been traditionally limited to applications that can tolerate the rough surface quality from wet etching without polishing. We have previously presented and discussed the motivation for producing channel cut crystals with strain-free polished surfaces [1]. Afterwards, we have undertaken an effort to design and implement an automated machine for polishing channel-cut crystals. The initial effort led to inefficient results. Since then, we conceptualized, designed, and implemented a new version of the channel-cut polishing machine, now called C-CHiRP (Channel-Cut High Resolution Polisher), also known as CCPM V2.0. The new machine design no longer utilizes Figure-8 motion that mimics manual polishing. Instead, the polishing is achieved by a combination of rotary and linear functions of two coordinated motion systems. Here we present the new design of C-CHiRP, its capabilities and features. Multiple channel-cut crystals polished using the C-CHiRP have been deployed into several beamlines at the Advanced Photon Source (APS). We present the measurements of surface finish, flatness, as well as topography results obtained at 1-BM of APS, as compared with results typically achieved when polishing flat-surface monochromator crystals using conventional polishing processes. Limitations of the current machine design, capabilities and considerations for strain-free polishing of highly complex crystals are also discussed, together with an outlook for future developments and improvements.},
doi = {10.1117/12.2277605},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Aug 23 00:00:00 EDT 2017},
month = {Wed Aug 23 00:00:00 EDT 2017}
}

Conference:
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  • The use of a channel-cut monochromator is the most straightforward method to ensure that the two reflection surfaces maintain alignment between crystallographic planes without the need for complicated alignment mechanisms. Three basic characteristics that affect monochromator performance are: subsurface damage which contaminates spectral purity; surface roughness which reduces efficiency due to scattering; and surface figure error which imparts intensity structure and coherence distortion in the beam. Standard chemical-mechanical polishing processes and equipment are used when the diffracting surface is easily accessible, such as for single-bounce monochromators. Due to the inaccessibly of the surfaces inside a channel-cut monochromator for polishing, thesemore » optics are generally wet-etched for their final processing. This results in minimal subsurface damage, but very poor roughness and figure error. A new CMP channel polishing instrument design is presented which allows the internal diffracting surface quality of channel-cut crystals to approach that of conventional single-bounce monochromators« less
  • A novel, silicon crystal monochromator has been designed and tested for use on undulator and focused wiggler beamlines at third-generation synchrotron sources. The crystal utilizes a thin, partially transmitting diffracting element fabricated within a liquid-nitrogen cooled, monolithic block of silicon. This report summarizes the results from performance tests conducted at the European Synchrotron Radiation Facility (ESRF) using a focused wiggler beam and at the Advanced Photon Source (APS) on an undulator beamline. These experiments indicate that a cryogenic crystal can handle the very high power and power density x-ray beams of modem synchrotrons with sub-arcsec thermal broadening of the rockingmore » curve. The peak power density absorbed on the surface of the crystal at the ESRF exceeded go W/mm{sup 2} with an absorbed power of 166 W, this takes into account the spreading of the beam due to the Bragg angle of 11.4{degrees}. At the APS, the peak heat flux incident on the crystal was 1.5 W/mA/mm{sup 2} with a power of 6.1 W/mA for a 2.0 H x 2.5 V mm{sup 2} beam at an undulator gap of 11.1 mm and stored current up to 96 mA.« less
  • We studied Bragg diffraction and Thermal Diffuse Scattering (TDS) from a Si(111) channel-cut triple-bounce crystal using the time-of-flight technique at a pulsed neutron source. Cadmium shielding restricted the detector s direct view of the first bounce surface. The channel-cut crystal dramatically suppresses TDS in the vicinity of the (111), (333) and (444) Bragg reflections; however, TDS appears and increases with the decrease of wavelength in the range of the (555), (777) and (888) orders where cadmium becomes transparent and the single-bounce reflections and TDS contaminate the triple-bounce (555), (777) and (888) reflections.
  • An artificial channel-cut crystal monochromator for the hard X-Ray beamlines of SASE 1&2, cryogenically cooled by the so-called pulse tube cooler (cryorefrigerator), is currently under development at the European XFEL (http://www.xfel.eu/). The fabrication is on-going. We present here the crystal optical consideration and the novel cooling configuration, according to the X-Ray FEL pulses proprieties. The mechanical design improvements are pointed out as well to implement such kind of monochromator based on the previous similar design.