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Title: Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties

Journal Article · · Physica Status Solidi. A, Applications and Materials Science
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  1. Centre Inter-universitaire de Recherche et d'Ingenierie des Materiaux (CIRIMAT) (France)
  2. Laboratoire d'Analyse et d'Architecture des Systemes LAAS-CNRS, Toulouse (France)
  3. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

Ti/Al 2 O 3 bilayer stacks are used as model systems to investigate the role of atomic layer deposition (ALD) and chemical vapor deposition (CVD) to prepare 30–180 nm thick amorphous alumina films as protective barriers for the medium temperature oxidation (500–600 °C) of titanium, which is employed in aeronautic applications. X‐ray diffraction (XRD), transmission electron microscopy (TEM) with selected area electron diffraction (SAED), and X‐ray photoelectron spectroscopy (XPS) results show that the films produced from the direct liquid injection (DLI) CVD of aluminum tri‐isopropoxide (ATI) are poor oxygen barriers. The films processed using the ALD of trimethylaluminum (TMA) show good barrier properties but an extensive intermixing with Ti which subsequently oxidizes. In contrast, the films prepared from dimethyl aluminum isopropoxide (DMAI) by CVD are excellent oxygen barriers and show little intermixing with Ti. Overall, these measurements correlate the effect of the alumina coating thickness, morphology, and stoichiometry resulting from the preparation method to the oxidation barrier properties, and show that compact and stoichiometric amorphous alumina films offer superior barrier properties.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1271874
Alternate ID(s):
OSTI ID: 1400943
Journal Information:
Physica Status Solidi. A, Applications and Materials Science, Vol. 213, Issue 2; ISSN 1862-6300
Publisher:
WileyCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 7 works
Citation information provided by
Web of Science

References (34)

A change of direction journal November 2009
γ-Alumina as a Support for Catalysts: A Review of Fundamental Aspects journal September 2005
CVD of Al2O3 Thin Films Using Aluminum Tri-isopropoxide journal August 2003
Growth of γ-Al2O3 thin films on silicon by low pressure metal-organic chemical vapour deposition journal May 1992
Nanoparticles of gold on γ-Al2O3 produced by dc magnetron sputtering journal April 2005
Metastable Alumina Polymorphs: Crystal Structures and Transition Sequences journal August 1998
Alumina-Coated Patterned Amorphous Silicon as the Anode for a Lithium-Ion Battery with High Coulombic Efficiency journal September 2011
Surface chemistry of metal oxide coated lithium manganese nickel oxide thin film cathodes studied by XPS journal February 2013
Atomic-Layer-Deposited Aluminum and Zirconium Oxides for Surface Passivation of TiO 2 in High-Efficiency Organic Photovoltaics journal June 2014
Corrosion protection of 304L stainless steel by chemical vapor deposited alumina coatings journal April 2014
Al2O3 coatings on stainless steel using pulsed-pressure MOCVD journal September 2013
The Hotter the Engine, the Better journal November 2009
The influence of oxides on the performance of advanced gas turbines journal January 2008
Silicon based oxidation-resistant coatings on Ti6242 alloy by dynamic ion mixing journal May 2006
Interface compounds formed during the diffusion bonding of Al2O3 to Ti journal January 2000
Interactions between Ti and alumina-based ceramics journal January 1992
Plasma-Enhanced CVD for Particle Synthesis Using Circulating Fluidized Bed Technology journal September 2007
Atomic layer deposition for nanostructured Li-ion batteries
  • Knoops, H. C. M.; Donders, M. E.; van de Sanden, M. C. M.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 1 https://doi.org/10.1116/1.3660699
journal January 2012
Silicon coating on very dense tungsten particles by fluidized bed CVD for nuclear application: Silicon coating on very dense tungstenparticles by fluidized bed CVD journal May 2015
3D negative electrode stacks for integrated all-solid-state lithium-ion microbatteries journal January 2010
Passive and heterogeneous integration towards a Si-based System-in-Package concept journal May 2006
Chemical vapor deposition of coatings on glass journal September 1997
CVD-Fabricated Aluminum Oxide Coatings from Aluminum tri-iso-propoxide: Correlation Between Processing Conditions and Composition journal January 2007
Mechanical and barrier properties of MOCVD processed alumina coatings on Ti6Al4V titanium alloy journal December 2011
Temperature-Dependent 4-, 5- and 6-Fold Coordination of Aluminum in MOCVD-Grown Amorphous Alumina Films: A Very High Field 27 Al-NMR study journal October 2013
Alumina thin films prepared by direct liquid injection chemical vapor deposition of dimethylaluminum isopropoxide: a process-structure investigation: Alumina thin films prepared by direct liquid injection chemical vapor deposition of dimethylaluminum isopropoxide: a process-structure investigation journal June 2015
Process-structure-properties relationship in direct liquid injection chemical vapor deposition of amorphous alumina from aluminum tri-isopropoxide: Process-structure-properties relationship in direct liquid injection chemical vapor deposition of amorphous alumina from aluminum tri-isopropoxide journal May 2015
Phase Analysis Studies on the Titanium-Oxygen System. journal January 1957
Disorder and Order in Solid Solutions of Oxygen in alpha-Titanium. journal January 1962
Fabrication of high-quality single-crystal Cu thin films using radio-frequency sputtering journal August 2014
Reduced Preferential Sputtering of TiO<sub>2</sub> using Massive Argon Clusters journal January 2014
Gitterkonstanten, Ausdehnungskoeffizienten, Dichten, Fehlordnung und Aufbau der Phase Titan(II)-Oxyd journal August 1960
Über Sauerstoff-haltige Verbindungen vom Strukturtyp B1 der ersten vier Übergangsmetalle journal November 1967
Crystallography and defect chemistry of solid solutions of vanadium and titanium oxides journal June 1969

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