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Title: Molten-NaNH 2 Densified Graphene with In-Plane Nanopores and N-Doping for Compact Capacitive Energy Storage

Authors:
 [1];  [1];  [1]; ORCiD logo [2]; ORCiD logo [1]
  1. Hubei Key Laboratory of Electrochemical Power Sources, College of Chemistry and Molecular Sciences, Wuhan University, Wuhan 430072 P. R. China
  2. Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge TN 37831 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1400632
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Advanced Energy Materials
Additional Journal Information:
Journal Volume: 7; Journal Issue: 20; Related Information: CHORUS Timestamp: 2017-10-25 11:01:48; Journal ID: ISSN 1614-6832
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Lin, Shuang, Zhang, Chunyan, Wang, Zhiyong, Dai, Sheng, and Jin, Xianbo. Molten-NaNH 2 Densified Graphene with In-Plane Nanopores and N-Doping for Compact Capacitive Energy Storage. Germany: N. p., 2017. Web. doi:10.1002/aenm.201700766.
Lin, Shuang, Zhang, Chunyan, Wang, Zhiyong, Dai, Sheng, & Jin, Xianbo. Molten-NaNH 2 Densified Graphene with In-Plane Nanopores and N-Doping for Compact Capacitive Energy Storage. Germany. doi:10.1002/aenm.201700766.
Lin, Shuang, Zhang, Chunyan, Wang, Zhiyong, Dai, Sheng, and Jin, Xianbo. Fri . "Molten-NaNH 2 Densified Graphene with In-Plane Nanopores and N-Doping for Compact Capacitive Energy Storage". Germany. doi:10.1002/aenm.201700766.
@article{osti_1400632,
title = {Molten-NaNH 2 Densified Graphene with In-Plane Nanopores and N-Doping for Compact Capacitive Energy Storage},
author = {Lin, Shuang and Zhang, Chunyan and Wang, Zhiyong and Dai, Sheng and Jin, Xianbo},
abstractNote = {},
doi = {10.1002/aenm.201700766},
journal = {Advanced Energy Materials},
number = 20,
volume = 7,
place = {Germany},
year = {Fri Jul 14 00:00:00 EDT 2017},
month = {Fri Jul 14 00:00:00 EDT 2017}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on July 14, 2018
Publisher's Accepted Manuscript

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