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Title: Apparatus and method for deterministic control of surface figure during full aperture pad polishing

Abstract

A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.

Inventors:
; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1398989
Patent Number(s):
9,782,871
Application Number:
14/055,780
Assignee:
Lawrence Livermore National Security, LLC LLNL
DOE Contract Number:  
AC52-07N27344
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Oct 16
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Suratwala, Tayyab Ishaq, Feit, Michael Douglas, and Steele, William Augustus. Apparatus and method for deterministic control of surface figure during full aperture pad polishing. United States: N. p., 2017. Web.
Suratwala, Tayyab Ishaq, Feit, Michael Douglas, & Steele, William Augustus. Apparatus and method for deterministic control of surface figure during full aperture pad polishing. United States.
Suratwala, Tayyab Ishaq, Feit, Michael Douglas, and Steele, William Augustus. Tue . "Apparatus and method for deterministic control of surface figure during full aperture pad polishing". United States. doi:. https://www.osti.gov/servlets/purl/1398989.
@article{osti_1398989,
title = {Apparatus and method for deterministic control of surface figure during full aperture pad polishing},
author = {Suratwala, Tayyab Ishaq and Feit, Michael Douglas and Steele, William Augustus},
abstractNote = {A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Oct 10 00:00:00 EDT 2017},
month = {Tue Oct 10 00:00:00 EDT 2017}
}

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