Photolithography process with gas-phase pretreatment
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patent
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December 2000 |
Method of forming high aspect ratio apertures
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patent
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January 2007 |
Complementary replacement of material
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patent
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July 2008 |
Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis
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patent
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December 2014 |
Methods of laser processing photoresist in a gaseous environment
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patent
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March 2015 |
Method for line density multiplication using block copolymers and sequential infiltration synthesis
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patent
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August 2016 |
Ordered nanoscale domains by infiltration of block copolymers
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patent
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November 2016 |
Plasma processing method
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patent-application
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May 2005 |
Method for manufacturing porous structure and method for forming pattern
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patent-application
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October 2006 |
TRILAYER RESIST SCHEME FOR GATE ETCHING APPLICATIONS
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patent-application
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April 2009 |
Method of Controlling Orientation of Domains in Block Copolymer Films
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patent-application
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July 2009 |
Methods Of Utilizing Block Copolymer To Form Patterns
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patent-application
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April 2010 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
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patent-application
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September 2010 |
Method for Forming a Block Copolymer Pattern
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patent-application
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August 2011 |
Ordered Nanoscale Domains by Infiltration of Block Copolymers
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patent-application
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February 2012 |
SEQUENTIAL INFILTRATION SYNTHESIS FOR ADVANCED LITHOGRAPHY
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patent-application
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September 2012 |
SELECTIVE ATOMIC LAYER DEPOSITION OF PASSIVATION LAYERS FOR SILICON-BASED PHOTOVOLTAIC DEVICES
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patent-application
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June 2013 |
An experimentally validated analytical model for gate line-edge roughness (LER) effects on technology scaling
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journal
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June 2001 |
High sensitive negative silylation process for 193nm lithography
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journal
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June 2000 |
Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications
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journal
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April 2010 |
Mobility analysis of surface roughness scattering in FinFET devices
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journal
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August 2011 |
Hierarchical self-assembly of metal nanostructures on diblock copolymer scaffolds
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journal
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December 2001 |
Optical Characterization and Process Control of Top Surface Imaging
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journal
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January 1999 |
Reduction of line edge roughness in the top surface imaging process
- Mori, Shigeyasu; Morisawa, Taku; Matsuzawa, Nobuyuki
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6, Article No. 3739
https://doi.org/10.1116/1.590409
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journal
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November 1998 |
A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates
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journal
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May 2011 |
Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers
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journal
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September 2010 |
Hollow Inorganic Nanospheres and Nanotubes with Tunable Wall Thicknesses by Atomic Layer Deposition on Self-Assembled Polymeric Templates
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journal
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January 2007 |
Approaches to deep ultraviolet photolithography utilizing acid hardened resin photoresist systems
- Thackeray, James W.; Orsula, George W.; Bohland, John F.
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 7, Issue 6, Article No. 1620
https://doi.org/10.1116/1.584502
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journal
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November 1989 |
Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis
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journal
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July 2011 |
Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early
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journal
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April 2012 |
Etch properties of resists modified by sequential infiltration synthesis
- Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
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Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 29, Issue 6, Article No. 06FG01
https://doi.org/10.1116/1.3640758
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journal
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November 2011 |
Nanoscopic Morphologies in Block Copolymer Nanorods as Templates for Atomic-Layer Deposition of Semiconductors
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journal
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April 2009 |
Statistical Modeling and Simulation of Threshold Variation Under Random Dopant Fluctuations and Line-Edge Roughness
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journal
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June 2011 |