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Title: Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process

Authors:
; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1398696
Grant/Contract Number:
DE AC36-08G028308; IUSSTF/JCERDC-SERIIUS/2012
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Chemical Engineering Journal
Additional Journal Information:
Journal Volume: 310; Journal Issue: P1; Related Information: CHORUS Timestamp: 2017-10-08 21:33:46; Journal ID: ISSN 1385-8947
Publisher:
Elsevier
Country of Publication:
Switzerland
Language:
English

Citation Formats

Chadha, Tandeep S., Yang, Mengmeng, Haddad, Kelsey, Shah, Vivek B., Li, Shuiqing, and Biswas, Pratim. Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process. Switzerland: N. p., 2017. Web. doi:10.1016/j.cej.2016.10.105.
Chadha, Tandeep S., Yang, Mengmeng, Haddad, Kelsey, Shah, Vivek B., Li, Shuiqing, & Biswas, Pratim. Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process. Switzerland. doi:10.1016/j.cej.2016.10.105.
Chadha, Tandeep S., Yang, Mengmeng, Haddad, Kelsey, Shah, Vivek B., Li, Shuiqing, and Biswas, Pratim. Wed . "Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process". Switzerland. doi:10.1016/j.cej.2016.10.105.
@article{osti_1398696,
title = {Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process},
author = {Chadha, Tandeep S. and Yang, Mengmeng and Haddad, Kelsey and Shah, Vivek B. and Li, Shuiqing and Biswas, Pratim},
abstractNote = {},
doi = {10.1016/j.cej.2016.10.105},
journal = {Chemical Engineering Journal},
number = P1,
volume = 310,
place = {Switzerland},
year = {Wed Feb 01 00:00:00 EST 2017},
month = {Wed Feb 01 00:00:00 EST 2017}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1016/j.cej.2016.10.105

Citation Metrics:
Cited by: 1work
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