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Title: Achieving diffraction-limited nanometer-scale X-ray point focus with two crossed multilayer Laue lenses: alignment challenges

Authors:
; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1396639
Grant/Contract Number:
SC0012704
Resource Type:
Journal Article: Published Article
Journal Name:
Optics Express
Additional Journal Information:
Journal Volume: 25; Journal Issue: 21; Related Information: CHORUS Timestamp: 2017-10-04 12:52:35; Journal ID: ISSN 1094-4087
Publisher:
Optical Society of America
Country of Publication:
United States
Language:
English

Citation Formats

Yan, Hanfei, Huang, Xiaojing, Bouet, Nathalie, Zhou, Juan, Nazaretski, Evgeny, and Chu, Yong S. Achieving diffraction-limited nanometer-scale X-ray point focus with two crossed multilayer Laue lenses: alignment challenges. United States: N. p., 2017. Web. doi:10.1364/OE.25.025234.
Yan, Hanfei, Huang, Xiaojing, Bouet, Nathalie, Zhou, Juan, Nazaretski, Evgeny, & Chu, Yong S. Achieving diffraction-limited nanometer-scale X-ray point focus with two crossed multilayer Laue lenses: alignment challenges. United States. doi:10.1364/OE.25.025234.
Yan, Hanfei, Huang, Xiaojing, Bouet, Nathalie, Zhou, Juan, Nazaretski, Evgeny, and Chu, Yong S. 2017. "Achieving diffraction-limited nanometer-scale X-ray point focus with two crossed multilayer Laue lenses: alignment challenges". United States. doi:10.1364/OE.25.025234.
@article{osti_1396639,
title = {Achieving diffraction-limited nanometer-scale X-ray point focus with two crossed multilayer Laue lenses: alignment challenges},
author = {Yan, Hanfei and Huang, Xiaojing and Bouet, Nathalie and Zhou, Juan and Nazaretski, Evgeny and Chu, Yong S.},
abstractNote = {},
doi = {10.1364/OE.25.025234},
journal = {Optics Express},
number = 21,
volume = 25,
place = {United States},
year = 2017,
month =
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1364/OE.25.025234

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  • Here, we report on the characterization of a multilayer Laue lens (MLL) with large acceptance, made of a novel WSi2/Al bilayer system. Fabrication of multilayers with large deposition thickness is required to obtain MLL structures with sufficient apertures capable of accepting the full lateral coherence length of x-rays at typical nanofocusing beamlines. To date, the total deposition thickness has been limited by stress-buildup in the multilayer. We were able to grow WSi2/Al with low grown-in stress, and asses the degree of stress reduction. X-ray diffraction experiments were conducted at beamline 1-BM at the Advanced Photon Source. We used monochromatic x-raysmore » with a photon energy of 12 keV and a bandwidth of ΔE/E=5.4 ∙ 10 -4. The MLL was grown with parallel layer interfaces, and was designed to have a large focal length of 9.6 mm. The mounted lens was 2.7 mm in width. We found and quantified kinks and bending of sections of the MLL. Sections with bending were found to partly have a systematic progression in the interface angles. We also observed kinking in some, but not all, areas. The measurements are compared with dynamic diffraction calculations made with Coupled Wave Theory. Finally our data are plotted showing the diffraction efficiency as a function of the external tilting angle of the entire mounted lens. This way of plotting the data was found to provide an overview into the diffraction properties of the whole lens, and enabled the following layer tilt analyses.« less
  • We report on the characterization of a multilayer Laue lens (MLL) with large acceptance, made of a novel WSi 2/Al bilayer system. Fabrication of multilayers with large deposition thickness is required to obtain MLL structures with sufficient apertures capable of accepting the full lateral coherence length of x-rays at typical nanofocusing beamlines. To date, the total deposition thickness has been limited by stress-buildup in the multilayer. We were able to grow WSi2/Al with low grown-in stress, and asses the degree of stress reduction. X-ray diffraction experiments were conducted at beamline 1-BM at the Advanced Photon Source. We used monochromatic x-rays with a photon energy of 12 keV and a bandwidth ofmore » $$ΔE/\atop {E}$$ = 5.4 • 10 -4. The MLL was grown with parallel layer interfaces, and was designed to have a large focal length of 9.6 mm. The mounted lens was 2.7 mm in width. We found and quantified kinks and bending of sections of the MLL. Sections with bending were found to partly have a systematic progression in the interface angles. We observed kinking in some, but not all, areas. The measurements are compared with dynamic diffraction calculations made with Coupled Wave Theory. Data are plotted showing the diffraction efficiency as a function of the external tilting angle of the entire mounted lens. This way of plotting the data was found to provide an overview into the diffraction properties of the whole lens, and enabled the following layer tilt analyses.« less
  • We report on the characterization of a multilayer Laue lens (MLL) with large acceptance, made of a novel WSi2/Al bilayer system. Fabrication of multilayers with large deposition thickness is required to obtain MLL structures with sufficient apertures capable of accepting the full lateral coherence length of x-rays at typical nanofocusing beamlines. To date, the total deposition thickness has been limited by stress-buildup in the multilayer. We were able to grow WSi2/Al with low grown-in stress, and asses the degree of stress reduction. X-ray diffraction experiments were conducted at beamline 1-BM at the Advanced Photon Source. We used monochromatic x-rays withmore » a photon energy of 12 keV and a bandwidth of Delta E/E = 5.4.10(-4). The MLL was grown with parallel layer interfaces, and was designed to have a large focal length of 9.6 mm. The mounted lens was 2.7 mm in width. We found and quantified kinks and bending of sections of the MLL. Sections with bending were found to partly have a systematic progression in the interface angles. We observed kinking in some, but not all, areas. The measurements are compared with dynamic diffraction calculations made with Coupled Wave Theory. Data are plotted showing the diffraction efficiency as a function of the external tilting angle of the entire mounted lens. This way of plotting the data was found to provide an overview into the diffraction properties of the whole lens, and enabled the following layer tilt analyses. (C) 2015 Optical Society of America« less
  • A modeling approach for x-ray dynamical diffraction from multilayer Laue lenses (MLLs) with rough interfaces is developed. Although still based on the principle of the distorted-wave Born approximation (DWBA), this model is formulated from the perspective of the physical scattering process, very different from the conventional DWBA formalism. Using this model, one can study x-ray scattering from rough interfaces in the regime of Fresnel diffraction and in the case of absorptive samples, for example, x-ray dynamical diffraction from MLLs with rough interfaces, which is hard to handle in the framework of the conventional DWBA. Theoretical simulations for various MLLs withmore » rough interfaces are conducted. It is found that interfacial roughness results in a decrease in the local diffraction intensity, where the attenuation factor is a function of the root-mean-square (rms) roughness versus the local zone width ratio. This study shows that if all zones possess an identical rms roughness value that is less than half of the outmost MLL zone width, the focal broadening effect due to roughness is almost unnoticeable, provided that the mean position of the interface does not deviate from the required zone plate law. A further study shows that uncorrelated interfacial roughness can be treated the same as interfacial diffusion, in which case a roughness factor similar to the ''Debye-Waller factor'' can be used, and the pseudo-Fourier coefficients of the susceptibility function for an MLL [H. F. Yan et al., Phys. Rev. B 76, 115438 (2007)] have to be multiplied by this factor.« less