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Title: Development of CVD Diamond for Industrial Applications Final Report CRADA No. TC-2047-02

Abstract

This project was a collaborative effort to develop and demonstrate a new millimeter microwave assisted chemical vapor deposition(CVD) process for manufacturing large diamond disks with greatly reduced processing times and costs from those now available. In the CVD process, carbon based gases (methane) and hydrogen are dissociated into plasma using microwave discharge and then deposited layer by layer as polycrystalline diamond onto a substrate. The available low frequency (2.45GHz) microwave sources used elsewhere (De Beers) result in low density plasmas and low deposition rates: 4 inch diamond disks take 6-8 weeks to process. The new system developed in this project uses a high frequency 30GHz Gyrotron as the microwave source and a quasi-optical CVD chamber resulting in a much higher density plasma which greatly reduced the diamond processing times (1-2 weeks)

Authors:
 [1];  [2];  [3];  [4]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. General Atomics, San Diego, CA (United States)
  3. Communications and Power Industries, Palo Alto, CA (United States)
  4. Russian Academy of Sciences (RAS), Moscow (Russian Federation)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1396221
Report Number(s):
LLNL-TR-738381
DOE Contract Number:
AC52-07NA27344
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Caplan, M., Olstad, R., Jory, H., and Vikharov, A. L. Development of CVD Diamond for Industrial Applications Final Report CRADA No. TC-2047-02. United States: N. p., 2017. Web. doi:10.2172/1396221.
Caplan, M., Olstad, R., Jory, H., & Vikharov, A. L. Development of CVD Diamond for Industrial Applications Final Report CRADA No. TC-2047-02. United States. doi:10.2172/1396221.
Caplan, M., Olstad, R., Jory, H., and Vikharov, A. L. 2017. "Development of CVD Diamond for Industrial Applications Final Report CRADA No. TC-2047-02". United States. doi:10.2172/1396221. https://www.osti.gov/servlets/purl/1396221.
@article{osti_1396221,
title = {Development of CVD Diamond for Industrial Applications Final Report CRADA No. TC-2047-02},
author = {Caplan, M. and Olstad, R. and Jory, H. and Vikharov, A. L.},
abstractNote = {This project was a collaborative effort to develop and demonstrate a new millimeter microwave assisted chemical vapor deposition(CVD) process for manufacturing large diamond disks with greatly reduced processing times and costs from those now available. In the CVD process, carbon based gases (methane) and hydrogen are dissociated into plasma using microwave discharge and then deposited layer by layer as polycrystalline diamond onto a substrate. The available low frequency (2.45GHz) microwave sources used elsewhere (De Beers) result in low density plasmas and low deposition rates: 4 inch diamond disks take 6-8 weeks to process. The new system developed in this project uses a high frequency 30GHz Gyrotron as the microwave source and a quasi-optical CVD chamber resulting in a much higher density plasma which greatly reduced the diamond processing times (1-2 weeks)},
doi = {10.2172/1396221},
journal = {},
number = ,
volume = ,
place = {United States},
year = 2017,
month = 9
}

Technical Report:

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