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Title: Profile etching for prefiguring X-ray mirrors

Abstract

A method to pre-shape mirror substrates through etching with a broad-beam ion source and a contoured mask is presented. A 100 mm-long elliptical cylinder substrate was obtained from a super-polished flat Si substrate with a 48 nm root-mean-square (r.m.s.) figure error and a 1.5 Å r.m.s. roughness after one profile-etching process at a beam voltage of 600 V without iteration. A follow-up profile coating can be used to achieve a final mirror. Profile etching and profile coating combined provide an economic way to make X-ray optics, such as nested Kirkpatrick–Baez mirrors.

Authors:
; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1395991
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article
Journal Name:
Journal of Synchrotron Radiation (Online)
Additional Journal Information:
Journal Volume: 22; Journal Issue: 2; Journal ID: ISSN 1600-5775
Publisher:
International Union of Crystallography
Country of Publication:
United States
Language:
English
Subject:
73 NUCLEAR PHYSICS AND RADIATION PHYSICS; Broad beam ion figuring; KB mirrors; ion etching; profile coating

Citation Formats

Liu, Chian, Qian, Jun, and Assoufid, Lahsen. Profile etching for prefiguring X-ray mirrors. United States: N. p., 2015. Web. doi:10.1107/S1600577515000624.
Liu, Chian, Qian, Jun, & Assoufid, Lahsen. Profile etching for prefiguring X-ray mirrors. United States. doi:10.1107/S1600577515000624.
Liu, Chian, Qian, Jun, and Assoufid, Lahsen. Wed . "Profile etching for prefiguring X-ray mirrors". United States. doi:10.1107/S1600577515000624.
@article{osti_1395991,
title = {Profile etching for prefiguring X-ray mirrors},
author = {Liu, Chian and Qian, Jun and Assoufid, Lahsen},
abstractNote = {A method to pre-shape mirror substrates through etching with a broad-beam ion source and a contoured mask is presented. A 100 mm-long elliptical cylinder substrate was obtained from a super-polished flat Si substrate with a 48 nm root-mean-square (r.m.s.) figure error and a 1.5 Å r.m.s. roughness after one profile-etching process at a beam voltage of 600 V without iteration. A follow-up profile coating can be used to achieve a final mirror. Profile etching and profile coating combined provide an economic way to make X-ray optics, such as nested Kirkpatrick–Baez mirrors.},
doi = {10.1107/S1600577515000624},
journal = {Journal of Synchrotron Radiation (Online)},
issn = {1600-5775},
number = 2,
volume = 22,
place = {United States},
year = {2015},
month = {2}
}

Works referenced in this record:

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Nanometer Linear Focusing of Hard X Rays by a Multilayer Laue Lens
journal, March 2006


Profile coating and its application for Kirkpatrick-Baez mirrors
journal, December 2003