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Title: Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma

Authors:
 [1]; ORCiD logo [2];  [1];  [1];  [1];  [3];  [1]
  1. University of California, San Diego, 9500 Gilman Dr., La Jolla, California 92093-0417, USA
  2. Departamento de Ingeniería Energética, UNED, C/Juan del Rosal 12, 28040 Madrid, Spain, Laboratorio Nacional de Fusion, Ciemat, Avenida Complutense 22, 28040 Madrid, Spain
  3. Department of Material Science, Shimane University, 1060 Nishikawatsu, Matsue 680-8605 Japan
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1392681
Grant/Contract Number:
FG02-07ER54912
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 122; Journal Issue: 11; Related Information: CHORUS Timestamp: 2018-02-14 20:18:53; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., and Nishijima, D. Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma. United States: N. p., 2017. Web. doi:10.1063/1.5002114.
Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., & Nishijima, D. Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma. United States. doi:10.1063/1.5002114.
Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., and Nishijima, D. 2017. "Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma". United States. doi:10.1063/1.5002114.
@article{osti_1392681,
title = {Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma},
author = {Hollmann, E. M. and Alegre, D. and Baldwin, M. J. and Chrobak, C. P. and Doerner, R. P. and Miyamoto, M. and Nishijima, D.},
abstractNote = {},
doi = {10.1063/1.5002114},
journal = {Journal of Applied Physics},
number = 11,
volume = 122,
place = {United States},
year = 2017,
month = 9
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on September 18, 2018
Publisher's Accepted Manuscript

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  • The paper presents an experimental study and analysis of full helium ion density angular distributions in a 4-kJ plasma focus device (PFD) at pressures of 10, 15, 25, and 30 mbar using large-area polycarbonate track detectors (PCTDs) (15-cm etchable diameter) processed by 50-Hz-HV electrochemical etching (ECE). Helium ion track distributions at different pressures, in particular, at the main axis of the PFD are presented. Maximum ion track density of ~4.4 × 10{sup 4} tracks/cm{sup 2} was obtained in the PCTD placed 6 cm from the anode. The ion distributions for all pressures applied are ring-shaped, which is possibly due tomore » the hollow cylindrical copper anode used. The large-area PCTD processed by ECE proves, at the present state-of-theart, a superior method for direct observation and analysis of ion distributions at a glance with minimum efforts and time. Some observations of the ion density distributions at different pressures are reported and discussed.« less
  • The angular distribution of 40-keV-argon-sputtered copper has been measured by collecting the copper on a semicircular superpure aluminum foil and later analyzing by 1.8-MeV-He backscattering. Comparison has been made of the distributions from a flat surface of (11 3 1) copper and a pyramid-covered surface of the same orientation. The overall yield from the pyramid-covered surface is approx.50% greater than from the flat. This result is in contradiction to earlier reports of sputtering yields from flat and rough surfaces. Directional effects of sputtering are observed from both flat and pyramid-covered surfaces with enhancement by a factor of approx.4 in themore » latter case.« less
  • We have found that the divergence of a relatively monochromatic extreme ultraviolet (EUV) emission from a laser-produced plasma can be manipulated by changing the target morphology which is a porous low-density tin oxide (SnO{sub 2}) structure. The fundamental light of a Nd-YAG laser was irradiated on the target with laser intensity of {approx}10{sup 11} W/cm{sup 2} and pulse duration of 10 ns. The nanostructure and density of the targets were tuned by a combination of colloidal polymer template and sol-gel processes [Gu, Nagai, Norimatsu, Fujioka, Nishimura, Nishihara, Miyanaga, and Izawa, Chem. Mater. 17, 1115 (2005)], which has a merit inmore » large-scale preparation. When the target has an open cell nanostructure, the EUV emission directed predominantly along target normal, while a closed cell target exhibited divergent emission. The angular distribution may be affected by the orientation of the microstructured initial target, and this phenomenon can be applied to wavefront control of EUV emission.« less