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Title: Defect Removal in the Course of Directed Self-Assembly is Facilitated in the Vicinity of the Order-Disorder Transition

Abstract

The stability of prototypical defect morphologies in thin films of symmetric diblock copolymers on chemically patterned substrates is investigated by self-consistent field theory. The excess free energy of defects and barriers of defect-removal mechanisms are obtained by computing the minimum free-energy path. Distinct defect-removal mechanisms are illustrated demonstrating that (i) defects will become unstable at a characteristic value of incompatibility χN* above the order-disorder transition and (ii) the kinetics is accelerated at weak segregation. Numerical findings are placed in the context of physical mechanisms, and implications for directed self-assembly are discussed.

Authors:
; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1392551
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 113; Journal Issue: 16; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English

Citation Formats

Li, Weihua, Nealey, Paul F., de Pablo, Juan J., and Müller, Marcus. Defect Removal in the Course of Directed Self-Assembly is Facilitated in the Vicinity of the Order-Disorder Transition. United States: N. p., 2014. Web. doi:10.1103/PhysRevLett.113.168301.
Li, Weihua, Nealey, Paul F., de Pablo, Juan J., & Müller, Marcus. Defect Removal in the Course of Directed Self-Assembly is Facilitated in the Vicinity of the Order-Disorder Transition. United States. doi:10.1103/PhysRevLett.113.168301.
Li, Weihua, Nealey, Paul F., de Pablo, Juan J., and Müller, Marcus. Wed . "Defect Removal in the Course of Directed Self-Assembly is Facilitated in the Vicinity of the Order-Disorder Transition". United States. doi:10.1103/PhysRevLett.113.168301.
@article{osti_1392551,
title = {Defect Removal in the Course of Directed Self-Assembly is Facilitated in the Vicinity of the Order-Disorder Transition},
author = {Li, Weihua and Nealey, Paul F. and de Pablo, Juan J. and Müller, Marcus},
abstractNote = {The stability of prototypical defect morphologies in thin films of symmetric diblock copolymers on chemically patterned substrates is investigated by self-consistent field theory. The excess free energy of defects and barriers of defect-removal mechanisms are obtained by computing the minimum free-energy path. Distinct defect-removal mechanisms are illustrated demonstrating that (i) defects will become unstable at a characteristic value of incompatibility χN* above the order-disorder transition and (ii) the kinetics is accelerated at weak segregation. Numerical findings are placed in the context of physical mechanisms, and implications for directed self-assembly are discussed.},
doi = {10.1103/PhysRevLett.113.168301},
journal = {Physical Review Letters},
issn = {0031-9007},
number = 16,
volume = 113,
place = {United States},
year = {2014},
month = {10}
}

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