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Title: Broadband perfect absorber based on one ultrathin layer of refractory metal

Abstract

Broadband perfect absorber based on one ultrathin layer of the refractory metal chromium without structure pat- terning is proposed and demonstrated. The ideal permittivity of the metal layer for achieving broadband perfect absorption is derived based on the impedance transformation method. Since the permittivity of the refractory metal chromium matches this ideal permittivity well in the visible and near-infrared range, a silica-chromium-silica three-layer absorber is fabricated to demonstrate the broadband perfect absorption. The experimental results under normal incidence show that the absorption is above 90% over the wavelength range of 0.4–1.4 μm, and the measurements under angled incidence within 400–800 nm prove that the absorber is angle-insensitive and polarization- independent.

Authors:
; ; ; ; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1392512
DOE Contract Number:
AC02-06CH11357
Resource Type:
Journal Article
Resource Relation:
Journal Name: Optics Letters; Journal Volume: 40; Journal Issue: 11
Country of Publication:
United States
Language:
English

Citation Formats

Deng, Huixu, Li, Zhigang, Stan, Liliana, Rosenmann, Daniel, Czaplewski, David, Gao, Jie, and Yang, Xiaodong. Broadband perfect absorber based on one ultrathin layer of refractory metal. United States: N. p., 2015. Web. doi:10.1364/OL.40.002592.
Deng, Huixu, Li, Zhigang, Stan, Liliana, Rosenmann, Daniel, Czaplewski, David, Gao, Jie, & Yang, Xiaodong. Broadband perfect absorber based on one ultrathin layer of refractory metal. United States. doi:10.1364/OL.40.002592.
Deng, Huixu, Li, Zhigang, Stan, Liliana, Rosenmann, Daniel, Czaplewski, David, Gao, Jie, and Yang, Xiaodong. Thu . "Broadband perfect absorber based on one ultrathin layer of refractory metal". United States. doi:10.1364/OL.40.002592.
@article{osti_1392512,
title = {Broadband perfect absorber based on one ultrathin layer of refractory metal},
author = {Deng, Huixu and Li, Zhigang and Stan, Liliana and Rosenmann, Daniel and Czaplewski, David and Gao, Jie and Yang, Xiaodong},
abstractNote = {Broadband perfect absorber based on one ultrathin layer of the refractory metal chromium without structure pat- terning is proposed and demonstrated. The ideal permittivity of the metal layer for achieving broadband perfect absorption is derived based on the impedance transformation method. Since the permittivity of the refractory metal chromium matches this ideal permittivity well in the visible and near-infrared range, a silica-chromium-silica three-layer absorber is fabricated to demonstrate the broadband perfect absorption. The experimental results under normal incidence show that the absorption is above 90% over the wavelength range of 0.4–1.4 μm, and the measurements under angled incidence within 400–800 nm prove that the absorber is angle-insensitive and polarization- independent.},
doi = {10.1364/OL.40.002592},
journal = {Optics Letters},
number = 11,
volume = 40,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 2015},
month = {Thu Jan 01 00:00:00 EST 2015}
}