Enhancing the stability of copper chromite catalysts for the selective hydrogenation of furfural using ALD overcoating

Journal Article · Fri Aug 01 00:00:00 EDT 2014 · Journal of Catalysis

DOI:https://doi.org/10.1016/j.jcat.2014.07.007· OSTI ID:1391702

Zhang, Hongbo; Lei, Yu; Kropf, A. Jeremy; Zhang, Guanghui ; Elam, Jeffrey W.; Miller, Jeffrey T.; Sollberger, Fred; Ribeiro, Fabio; Akatay, M. Cem; Stach, Eric A.; Dumesic, James A.; Marshall, Christopher L.

The stability of a gas-phase furfural hydrogenation catalyst (CuCr2O4 center dot CuO) was enhanced by depositing a thin Al2O3 layer using atomic layer deposition (ALD). Based on temperature-programed reduction (TPR) measurements, the reduction temperature of Cu was raised significantly, and the activation energy for furfural reduction was decreased following the ALD treatment. Thinner ALD layers yielded higher furfural hydrogenation activities. X-ray absorption fine structure (XAFS) spectroscopy studies indicated that Cu1+/Cu-0 are the active species for furfural reduction.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES)
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 1391702
• Journal Information: Journal of Catalysis, Vol. 317, Issue C; ISSN 0021-9517
• Publisher: Elsevier
• Country of Publication: United States
• Language: English

Related Subjects

2-Furfuraldehyde
ALD
Catalyst Stability
Copper chromite
Furfuryl alcohol
Operando
Selective hydrogenation
TPR
XAFS