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Title: Manufacturing Steps for Commercial Production of Nano-Structure Capacitors Final Report CRADA No. TC02159.0

Abstract

This was a collaborative effort between Lawrence Livermore National Security, LLC as manager and operator of Lawrence Livermore National Laboratory (LLNL) and TroyCap LLC, to develop manufacturing steps for commercial production of nano-structure capacitors. The technical objective of this project was to demonstrate high deposition rates of selected dielectric materials which are 2 to 5 times larger than typical using current technology.

Authors:
 [1];  [1]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1389957
Report Number(s):
LLNL-TR-737826
DOE Contract Number:  
AC52-07NA27344
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; 25 ENERGY STORAGE

Citation Formats

Barbee, T. W., and Schena, D. Manufacturing Steps for Commercial Production of Nano-Structure Capacitors Final Report CRADA No. TC02159.0. United States: N. p., 2017. Web. doi:10.2172/1389957.
Barbee, T. W., & Schena, D. Manufacturing Steps for Commercial Production of Nano-Structure Capacitors Final Report CRADA No. TC02159.0. United States. doi:10.2172/1389957.
Barbee, T. W., and Schena, D. Tue . "Manufacturing Steps for Commercial Production of Nano-Structure Capacitors Final Report CRADA No. TC02159.0". United States. doi:10.2172/1389957. https://www.osti.gov/servlets/purl/1389957.
@article{osti_1389957,
title = {Manufacturing Steps for Commercial Production of Nano-Structure Capacitors Final Report CRADA No. TC02159.0},
author = {Barbee, T. W. and Schena, D.},
abstractNote = {This was a collaborative effort between Lawrence Livermore National Security, LLC as manager and operator of Lawrence Livermore National Laboratory (LLNL) and TroyCap LLC, to develop manufacturing steps for commercial production of nano-structure capacitors. The technical objective of this project was to demonstrate high deposition rates of selected dielectric materials which are 2 to 5 times larger than typical using current technology.},
doi = {10.2172/1389957},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {8}
}

Technical Report:

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