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Title: Enhanced Electrical Activation in In-Implanted Si0.35Ge0.65 by C Co-Doping

Journal Article · · Materials Research Letters
 [1];  [1];  [2];  [1];  [3];  [4];  [1];  [5];  [5];  [6];  [1]
  1. Australian National Univ., Canberra, ACT (Australia)
  2. Brookhaven National Lab. (BNL), Upton, NY (United States)
  3. Katholieke Univ. Leuven, Heverlee (Belgium)
  4. Australian Nuclear Science and Technology Organisation (ANSTO), Melbourne, VIC (Australia). Australian Synchrotron
  5. Aarhus Univ. (Denmark)
  6. RMIT Univ., Melbourne, VIC (Australia)

In this report, we have achieved a significant increase in the electrically active dopant fraction in Indium (In)-implanted Si0.35Ge0.65, by co-doping with the isovalent element Carbon (C). Electrical measurements have been correlated with X-ray absorption spectroscopy to determine the electrical properties and the In atom lattice location. With C+In co-doping, the solid solubility of In in Si0.35Ge0.65 was at least tripled from between 0.02 and 0.06 at% to between 0.2 and 0.6 at% as a result of C–In pair formation, which suppressed In metal precipitation. A dramatic improvement of electrical properties was thus attained in the co-doped samples.

Research Organization:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Nuclear Physics (NP)
Grant/Contract Number:
SC0012704
OSTI ID:
1389235
Report Number(s):
BNL-114207-2017-JA; TRN: US1702364
Journal Information:
Materials Research Letters, Vol. 5, Issue 1; ISSN 2166-3831
Publisher:
Taylor and FrancisCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 1 work
Citation information provided by
Web of Science

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