Enhanced Electrical Activation in In-Implanted Si0.35Ge0.65 by C Co-Doping
Journal Article
·
· Materials Research Letters
- Australian National Univ., Canberra, ACT (Australia)
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Katholieke Univ. Leuven, Heverlee (Belgium)
- Australian Nuclear Science and Technology Organisation (ANSTO), Melbourne, VIC (Australia). Australian Synchrotron
- Aarhus Univ. (Denmark)
- RMIT Univ., Melbourne, VIC (Australia)
In this report, we have achieved a significant increase in the electrically active dopant fraction in Indium (In)-implanted Si0.35Ge0.65, by co-doping with the isovalent element Carbon (C). Electrical measurements have been correlated with X-ray absorption spectroscopy to determine the electrical properties and the In atom lattice location. With C+In co-doping, the solid solubility of In in Si0.35Ge0.65 was at least tripled from between 0.02 and 0.06 at% to between 0.2 and 0.6 at% as a result of C–In pair formation, which suppressed In metal precipitation. A dramatic improvement of electrical properties was thus attained in the co-doped samples.
- Research Organization:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Nuclear Physics (NP)
- Grant/Contract Number:
- SC0012704
- OSTI ID:
- 1389235
- Report Number(s):
- BNL-114207-2017-JA; TRN: US1702364
- Journal Information:
- Materials Research Letters, Vol. 5, Issue 1; ISSN 2166-3831
- Publisher:
- Taylor and FrancisCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 1 work
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