Thermodynamic Stability of Low-k Amorphous SiOCH Dielectric Films
- Authors:
-
- Peter A. Rock Thermochemistry Laboratory and NEAT ORU, University of California Davis, Davis California 95616
- Logic Technology Development, Intel Corporation, Hillsboro Oregon 97124
- Peter A. Rock Thermochemistry Laboratory and NEAT ORU, University of California Davis, Davis California 95616; Department of Chemistry, N.I. Lobachevsky State University of Nizhny Novgorod, 23 Gagarin Avenue Nizhny Novgorod 603950 Russia
- Publication Date:
- Research Org.:
- Energy Frontier Research Centers (EFRC) (United States). Fluid Interface Reactions, Structures and Transport Center (FIRST)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1388521
- DOE Contract Number:
- ERKCC61
- Resource Type:
- Journal Article
- Journal Name:
- Journal of the American Ceramic Society
- Additional Journal Information:
- Journal Volume: 99; Journal Issue: 8; Related Information: FIRST partners with Oak Ridge National Laboratory (lead); Argonne National Laboratory; Drexel University; Georgia State University; Northwestern University; Pennsylvania State University; Suffolk University; Vanderbilt University; University of Virginia; Journal ID: ISSN 0002-7820
- Publisher:
- American Ceramic Society
- Country of Publication:
- United States
- Language:
- English
- Subject:
- catalysis (heterogeneous), solar (fuels), energy storage (including batteries and capacitors), hydrogen and fuel cells, electrodes - solar, mechanical behavior, charge transport, materials and chemistry by design, synthesis (novel materials)
Citation Formats
Chen, Jiewei, King, Sean W., Muthuswamy, Elayaraja, Koryttseva, Anastasia, Wu, Di, Navrotsky, Alexandra, and Riedel, R. Thermodynamic Stability of Low-k Amorphous SiOCH Dielectric Films. United States: N. p., 2016.
Web. doi:10.1111/jace.14268.
Chen, Jiewei, King, Sean W., Muthuswamy, Elayaraja, Koryttseva, Anastasia, Wu, Di, Navrotsky, Alexandra, & Riedel, R. Thermodynamic Stability of Low-k Amorphous SiOCH Dielectric Films. United States. https://doi.org/10.1111/jace.14268
Chen, Jiewei, King, Sean W., Muthuswamy, Elayaraja, Koryttseva, Anastasia, Wu, Di, Navrotsky, Alexandra, and Riedel, R. 2016.
"Thermodynamic Stability of Low-k Amorphous SiOCH Dielectric Films". United States. https://doi.org/10.1111/jace.14268.
@article{osti_1388521,
title = {Thermodynamic Stability of Low-k Amorphous SiOCH Dielectric Films},
author = {Chen, Jiewei and King, Sean W. and Muthuswamy, Elayaraja and Koryttseva, Anastasia and Wu, Di and Navrotsky, Alexandra and Riedel, R.},
abstractNote = {},
doi = {10.1111/jace.14268},
url = {https://www.osti.gov/biblio/1388521},
journal = {Journal of the American Ceramic Society},
issn = {0002-7820},
number = 8,
volume = 99,
place = {United States},
year = {Mon Apr 25 00:00:00 EDT 2016},
month = {Mon Apr 25 00:00:00 EDT 2016}
}
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