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Title: Chemical vapor deposition of monolayer MoS2 directly on ultrathin Al2O3 for low-power electronics

Authors:
 [1]; ORCiD logo [1];  [1];  [1]; ORCiD logo [1]; ORCiD logo [2];  [3];  [4]; ORCiD logo [5]
  1. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA
  2. Applied Physics Graduate Program, Northwestern University, Evanston, Illinois 60208, USA
  3. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA; Applied Physics Graduate Program, Northwestern University, Evanston, Illinois 60208, USA; Department of Physics and Astronomy, Northwestern University, Evanston, Illinois 60208, USA
  4. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA
  5. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA; Applied Physics Graduate Program, Northwestern University, Evanston, Illinois 60208, USA; Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA; Department of Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, USA
Publication Date:
Research Org.:
Energy Frontier Research Centers (EFRC) (United States). Argonne-Northwestern Solar Energy Research Center (ANSER)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1388139
DOE Contract Number:
SC0001059
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 110; Journal Issue: 5; Related Information: ANSER partners with Northwestern University (lead); Argonne National Laboratory; University of Chicago; University of Illinois, Urbana-Champaign; Yale University
Country of Publication:
United States
Language:
English
Subject:
catalysis (homogeneous), catalysis (heterogeneous), solar (photovoltaic), solar (fuels), photosynthesis (natural and artificial), bio-inspired, hydrogen and fuel cells, electrodes - solar, defects, charge transport, spin dynamics, membrane, materials and chemistry by design, optics, synthesis (novel materials), synthesis (self-assembly)

Citation Formats

Bergeron, Hadallia, Sangwan, Vinod K., McMorrow, Julian J., Campbell, Gavin P., Balla, Itamar, Liu, Xiaolong, Bedzyk, Michael J., Marks, Tobin J., and Hersam, Mark C.. Chemical vapor deposition of monolayer MoS2 directly on ultrathin Al2O3 for low-power electronics. United States: N. p., 2017. Web. doi:10.1063/1.4975064.
Bergeron, Hadallia, Sangwan, Vinod K., McMorrow, Julian J., Campbell, Gavin P., Balla, Itamar, Liu, Xiaolong, Bedzyk, Michael J., Marks, Tobin J., & Hersam, Mark C.. Chemical vapor deposition of monolayer MoS2 directly on ultrathin Al2O3 for low-power electronics. United States. doi:10.1063/1.4975064.
Bergeron, Hadallia, Sangwan, Vinod K., McMorrow, Julian J., Campbell, Gavin P., Balla, Itamar, Liu, Xiaolong, Bedzyk, Michael J., Marks, Tobin J., and Hersam, Mark C.. Mon . "Chemical vapor deposition of monolayer MoS2 directly on ultrathin Al2O3 for low-power electronics". United States. doi:10.1063/1.4975064.
@article{osti_1388139,
title = {Chemical vapor deposition of monolayer MoS2 directly on ultrathin Al2O3 for low-power electronics},
author = {Bergeron, Hadallia and Sangwan, Vinod K. and McMorrow, Julian J. and Campbell, Gavin P. and Balla, Itamar and Liu, Xiaolong and Bedzyk, Michael J. and Marks, Tobin J. and Hersam, Mark C.},
abstractNote = {},
doi = {10.1063/1.4975064},
journal = {Applied Physics Letters},
number = 5,
volume = 110,
place = {United States},
year = {Mon Jan 30 00:00:00 EST 2017},
month = {Mon Jan 30 00:00:00 EST 2017}
}
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