Comparative evaluation of CVD diamond technologies
- General Electric Corporate Research & Development Center, Schenectady, NY (United States)
Chemical vapor deposition (CVD) of diamonds occurs from hydrogen-hydrocarbon gas mixtures in the presence of atomic hydrogen at subatmospheric pressures. Most CVD methods are based on different means of generating and transporting atomic hydrogen in a particular system. Evaluation of these different techniques involves their capital costs, material costs, energy costs, labor costs and the type and quality of diamond that they produce. Currently, there is no universal agreement on which is the best technique and technique selection has been largely driven by the professional background of the user as well as the particular application of interest. This article discusses the criteria for evaluating a process for low-pressure deposition of diamond. Next, a brief history of low-pressure diamond synthesis is reviewed. Several specific processes are addressed, including the hot filament process, hot filament electron-assisted chemical vapor deposition, and plasma generation of atomic hydrogen by glow discharge, microwave discharge, low pressure radio frequency discharge, high pressure DC discharge, high pressure microwave discharge jets, high pressure RF discharge, and high and low pressure flames. Other types of diamond deposition methods are also evaluated. 101 refs., 15 figs.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- OSTI ID:
- 138808
- Report Number(s):
- CONF-920262-; ON: DE93007491; TRN: 93:000789-005
- Resource Relation:
- Conference: Workshop on diamond and diamond-like carbon film for the transportation industry, Argonne, IL (United States), 4-5 Feb 1992; Other Information: PBD: Jan 1993; Related Information: Is Part Of Workshop on diamond and diamond-like-carbon films for the transportation industry; Nichols, F.A.; Moores, D.K. [eds.]; PB: 385 p.
- Country of Publication:
- United States
- Language:
- English
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