Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function

Journal Article · Mon Jun 30 00:00:00 EDT 2014 · Nano Letters

DOI:https://doi.org/10.1021/nl5013773· OSTI ID:1385585

Manfrinato, Vitor R. ^[1]; Wen, Jianguo ^[1]; Zhang, Lihua ^[1]; Yang, Yujia ^[1]; Hobbs, Richard G. ^[1]; Baker, Bowen ^[1]; Su, Dong ^[1]; Zakharov, Dmitri ^[1]; Zaluzec, Nestor J. ^[1]; Miller, Dean J. ^[1]; Stach, Eric A. ^[1]; Berggren, Karl K. ^[1]

---

1. Electrical Engineering and Computer Science Department, MIT, Cambridge, Massachusetts 02139, United States; Electron Microscopy Center, Argonne National Laboratory, Lemont, Illinois 60439, United States; Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States

• Research Organization: Energy Frontier Research Centers (EFRC) (United States). Center for Excitonics (CE)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES)
• DOE Contract Number: SC0001088
• OSTI ID: 1385585
• Journal Information: Nano Letters, Vol. 14, Issue 8; Related Information: CE partners with Massachusetts Institute of Technology (lead); Brookhaven National Laboratory; Harvard University; ISSN 1530-6984
• Publisher: American Chemical Society
• Country of Publication: United States
• Language: English

Related Subjects

solar (photovoltaic)
solid state lighting
photosynthesis (natural and artificial)
charge transport
optics
synthesis (novel materials)
synthesis (self-assembly)
synthesis (scalable processing)