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Title: Low temperature atomic layer deposition of highly photoactive hematite using iron(iii) chloride and water

Authors:
; ; ; ; ; ;
Publication Date:
Research Org.:
Energy Frontier Research Centers (EFRC) (United States). Argonne-Northwestern Solar Energy Research Center (ANSER)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1383575
DOE Contract Number:  
SC0001059
Resource Type:
Journal Article
Journal Name:
Journal of Materials Chemistry. A
Additional Journal Information:
Journal Volume: 1; Journal Issue: 38; Related Information: ANSER partners with Northwestern University (lead); Argonne National Laboratory; University of Chicago; University of Illinois, Urbana-Champaign; Yale University; Journal ID: ISSN 2050-7488
Publisher:
Royal Society of Chemistry
Country of Publication:
United States
Language:
English
Subject:
catalysis (homogeneous), catalysis (heterogeneous), solar (photovoltaic), solar (fuels), photosynthesis (natural and artificial), bio-inspired, hydrogen and fuel cells, electrodes - solar, defects, charge transport, spin dynamics, membrane, materials and chemistry by design, optics, synthesis (novel materials), synthesis (self-assembly)

Citation Formats

Klug, Jeffrey A., Becker, Nicholas G., Riha, Shannon C., Martinson, Alex B. F., Elam, Jeffrey W., Pellin, Michael J., and Proslier, Thomas. Low temperature atomic layer deposition of highly photoactive hematite using iron(iii) chloride and water. United States: N. p., 2013. Web. doi:10.1039/c3ta12514a.
Klug, Jeffrey A., Becker, Nicholas G., Riha, Shannon C., Martinson, Alex B. F., Elam, Jeffrey W., Pellin, Michael J., & Proslier, Thomas. Low temperature atomic layer deposition of highly photoactive hematite using iron(iii) chloride and water. United States. doi:10.1039/c3ta12514a.
Klug, Jeffrey A., Becker, Nicholas G., Riha, Shannon C., Martinson, Alex B. F., Elam, Jeffrey W., Pellin, Michael J., and Proslier, Thomas. Tue . "Low temperature atomic layer deposition of highly photoactive hematite using iron(iii) chloride and water". United States. doi:10.1039/c3ta12514a.
@article{osti_1383575,
title = {Low temperature atomic layer deposition of highly photoactive hematite using iron(iii) chloride and water},
author = {Klug, Jeffrey A. and Becker, Nicholas G. and Riha, Shannon C. and Martinson, Alex B. F. and Elam, Jeffrey W. and Pellin, Michael J. and Proslier, Thomas},
abstractNote = {},
doi = {10.1039/c3ta12514a},
journal = {Journal of Materials Chemistry. A},
issn = {2050-7488},
number = 38,
volume = 1,
place = {United States},
year = {2013},
month = {1}
}

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