Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films
Journal Article
·
· Journal of Applied Physics
- Research Organization:
- Energy Frontier Research Centers (EFRC) (United States). Nanostructures for Electrical Energy Storage (NEES)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- DOE Contract Number:
- SC0001160
- OSTI ID:
- 1382621
- Journal Information:
- Journal of Applied Physics, Vol. 108, Issue 4; Related Information: NEES partners with University of Maryland (lead); University of California, Irvine; University of Florida; Los Alamos National Laboratory; Sandia National Laboratories; Yale University; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
Similar Records
Electrical and optical properties of Ti doped ZnO films grown on glass substrate by atomic layer deposition
Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapor deposition
Atomic layer deposition of Al-doped ZnO films using ozone as the oxygen source: A comparison of two methods to deliver aluminum
Journal Article
·
Mon Sep 15 00:00:00 EDT 2014
· Materials Research Bulletin
·
OSTI ID:1382621
+10 more
Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapor deposition
Journal Article
·
Wed Aug 15 00:00:00 EDT 2007
· Journal of Applied Physics
·
OSTI ID:1382621
Atomic layer deposition of Al-doped ZnO films using ozone as the oxygen source: A comparison of two methods to deliver aluminum
Journal Article
·
Sun Jan 15 00:00:00 EST 2012
· Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
·
OSTI ID:1382621
+3 more