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Title: The origin of low water vapor transmission rates through Al2O3/ZrO2 nanolaminate gas-diffusion barriers grown by atomic layer deposition

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3455324· OSTI ID:1382002

Research Organization:
Energy Frontier Research Centers (EFRC) (United States). Center for Interface Science: Solar Electric Materials (CISSEM)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
DOE Contract Number:
SC0001084
OSTI ID:
1382002
Journal Information:
Applied Physics Letters, Vol. 96, Issue 24; Related Information: CISSEM partners with the University of Arizona (lead); Georgia Institute of Technology; National Renewable Energy Laboratory; Princeton University; University of Washington; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English

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Al 2 O 3 /ZrO 2 Nanolaminates as Ultrahigh Gas-Diffusion Barriers-A Strategy for Reliable Encapsulation of Organic Electronics journal May 2009
Reliable thin film encapsulation for organic light emitting diodes grown by low-temperature atomic layer deposition journal June 2009
Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition journal March 2008