Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

Anders, André

doi:10.1063/1.4978350

Title: Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

Journal Article · Tue Mar 21 00:00:00 EDT 2017 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4978350· OSTI ID:1379841

^[1]

Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. Furthermore, by applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized. In contrast to conventional magnetron sputtering, HiPIMS is characterized by self-sputtering or repeated gas recycling for high and low sputter yield materials, respectively, and both for most intermediate materials. The dense plasma in front of the target has the dual function of sustaining the discharge and providing plasma-assistance to film growth, affecting the microstructure of growing films. Many technologically interesting thin films are compound films, which are composed of one or more metals and a reactive gas, most often oxygen or nitrogen. When reactive gas is added, non-trivial consequences arise for the system because the target may become “poisoned,” i.e., a compound layer forms on the target surface affecting the sputtering yield and the yield of secondary electron emission and thereby all other parameters. It is emphasized that the target state depends not only on the reactive gas' partial pressure (balanced via gas flow and pumping) but also on the ion flux to the target, which can be controlled by pulse parameters. This is a critical technological opportunity for reactive HiPIMS (R-HiPIMS). The scope of this tutorial is focused on plasma processes and mechanisms of operation and only briefly touches upon film properties. It introduces R-HiPIMS in a systematic, step-by-step approach by covering sputtering, magnetron sputtering, reactive magnetron sputtering, pulsed reactive magnetron sputtering, HiPIMS, and finally R-HiPIMS. The tutorial is concluded by considering variations of R-HiPIMS known as modulated pulsed power magnetron sputtering and deep-oscillation magnetron sputtering and combinations of R-HiPIMS with superimposed dc magnetron sputtering.

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Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1379841

Journal Information:: Journal of Applied Physics, Vol. 121, Issue 17; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 118 works

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Structure evolution and properties of TiAlCN/VCN coatings deposited by reactive HIPIMS Hovsepian, P. Eh.; Ehiasarian, A. P.; Petrov, I. Surface and Coatings Technology, Vol. 257 https://doi.org/10.1016/j.surfcoat.2014.07.065	journal	October 2014
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Modelling of cluster emission from metal surfaces under ion impact Betz, G.; Husinsky, W. Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences, Vol. 362, Issue 1814 https://doi.org/10.1098/rsta.2003.1302	journal	November 2003
Spatially averaged (global) model of time modulated high density argon plasmas Ashida, Sumio; Lee, C.; Lieberman, M. A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 13, Issue 5 https://doi.org/10.1116/1.579494	journal	September 1995
Effect of N2 flow rate on the microstructure and electrochemical behavior of TaNx films deposited by modulated pulsed power magnetron sputtering Mendizabal, L.; Bayón, R.; G-Berasategui, E. Thin Solid Films, Vol. 610 https://doi.org/10.1016/j.tsf.2016.04.043	journal	July 2016
AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering for SAW applications Aissa, K. Ait; Achour, A.; Elmazria, O. Journal of Physics D: Applied Physics, Vol. 48, Issue 14 https://doi.org/10.1088/0022-3727/48/14/145307	journal	March 2015
Wear associated with growth defects in combined cathodic arc/unbalanced magnetron sputtered CrN/NbN superlattice coatings during erosion in alkaline slurry Wang, H. W.; Stack, M. M.; Lyon, S. B. Surface and Coatings Technology, Vol. 135, Issue 1 https://doi.org/10.1016/S0257-8972(00)00913-0	journal	December 2000
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