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Title: Near atomically smooth alkali antimonide photocathode thin films

Abstract

Nano-roughness is one of the major factors degrading the emittance of electron beams that can be generated by high efficiency photocathodes, such as the thermally reacted alkali antimonide thin films. In this paper, we demonstrate a co-deposition based method for producing alkali antimonide cathodes that produce near atomic smoothness with high reproducibility. Here, we calculate the effect of the surface roughness on the emittance and show that such smooth cathode surfaces are essential for operation of alkali antimonide cathodes in high field, low emittance radio frequency electron guns and to obtain ultracold electrons for ultrafast electron diffraction applications.

Authors:
ORCiD logo [1];  [1];  [1];  [1];  [2];  [1]
  1. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
  2. Brookhaven National Lab. (BNL), Upton, NY (United States)
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1379694
Alternate Identifier(s):
OSTI ID: 1361746
Grant/Contract Number:  
AC02-05CH11231; KC407-ALSJNT-I00103; SC0005713; KC0407-ALSJNT-I0013
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 121; Journal Issue: 4; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY

Citation Formats

Feng, Jun, Karkare, Siddharth, Nasiatka, James, Schubert, Susanne, Smedley, John, and Padmore, Howard. Near atomically smooth alkali antimonide photocathode thin films. United States: N. p., 2017. Web. doi:10.1063/1.4974363.
Feng, Jun, Karkare, Siddharth, Nasiatka, James, Schubert, Susanne, Smedley, John, & Padmore, Howard. Near atomically smooth alkali antimonide photocathode thin films. United States. doi:10.1063/1.4974363.
Feng, Jun, Karkare, Siddharth, Nasiatka, James, Schubert, Susanne, Smedley, John, and Padmore, Howard. Tue . "Near atomically smooth alkali antimonide photocathode thin films". United States. doi:10.1063/1.4974363. https://www.osti.gov/servlets/purl/1379694.
@article{osti_1379694,
title = {Near atomically smooth alkali antimonide photocathode thin films},
author = {Feng, Jun and Karkare, Siddharth and Nasiatka, James and Schubert, Susanne and Smedley, John and Padmore, Howard},
abstractNote = {Nano-roughness is one of the major factors degrading the emittance of electron beams that can be generated by high efficiency photocathodes, such as the thermally reacted alkali antimonide thin films. In this paper, we demonstrate a co-deposition based method for producing alkali antimonide cathodes that produce near atomic smoothness with high reproducibility. Here, we calculate the effect of the surface roughness on the emittance and show that such smooth cathode surfaces are essential for operation of alkali antimonide cathodes in high field, low emittance radio frequency electron guns and to obtain ultracold electrons for ultrafast electron diffraction applications.},
doi = {10.1063/1.4974363},
journal = {Journal of Applied Physics},
number = 4,
volume = 121,
place = {United States},
year = {Tue Jan 24 00:00:00 EST 2017},
month = {Tue Jan 24 00:00:00 EST 2017}
}

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Cited by: 4 works
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Works referenced in this record:

Inverse compton scattering gamma ray source
journal, September 2009

  • Boucher, S.; Frigola, P.; Murokh, A.
  • Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 608, Issue 1, p. S54-S56
  • DOI: 10.1016/j.nima.2009.05.035