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Title: Atomic level cleaning of poly-methyl-methacrylate residues from the graphene surface using radiolized water at high temperatures

Authors:
ORCiD logo [1];  [2];  [3]; ORCiD logo [1];  [4]; ORCiD logo [2];  [4]
  1. Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Dayton, Ohio 45433, USA, Biological and Nanoscale Technologies, UES, Inc., Beavercreek, Ohio 45432, USA
  2. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA
  3. Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Dayton, Ohio 45433, USA, National Research Council, Washington, District of Columbia 20001, USA
  4. Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Dayton, Ohio 45433, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1378392
Grant/Contract Number:
SC0012704
Resource Type:
Journal Article: Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 111; Journal Issue: 10; Related Information: CHORUS Timestamp: 2018-02-14 19:56:29; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Islam, Ahmad Ehteshamul, Zakharov, Dmitri N., Carpena-Nuňez, Jennifer, Hsiao, Ming-Siao, Drummy, Lawrence F., Stach, Eric A., and Maruyama, Benji. Atomic level cleaning of poly-methyl-methacrylate residues from the graphene surface using radiolized water at high temperatures. United States: N. p., 2017. Web. doi:10.1063/1.5001479.
Islam, Ahmad Ehteshamul, Zakharov, Dmitri N., Carpena-Nuňez, Jennifer, Hsiao, Ming-Siao, Drummy, Lawrence F., Stach, Eric A., & Maruyama, Benji. Atomic level cleaning of poly-methyl-methacrylate residues from the graphene surface using radiolized water at high temperatures. United States. doi:10.1063/1.5001479.
Islam, Ahmad Ehteshamul, Zakharov, Dmitri N., Carpena-Nuňez, Jennifer, Hsiao, Ming-Siao, Drummy, Lawrence F., Stach, Eric A., and Maruyama, Benji. Mon . "Atomic level cleaning of poly-methyl-methacrylate residues from the graphene surface using radiolized water at high temperatures". United States. doi:10.1063/1.5001479.
@article{osti_1378392,
title = {Atomic level cleaning of poly-methyl-methacrylate residues from the graphene surface using radiolized water at high temperatures},
author = {Islam, Ahmad Ehteshamul and Zakharov, Dmitri N. and Carpena-Nuňez, Jennifer and Hsiao, Ming-Siao and Drummy, Lawrence F. and Stach, Eric A. and Maruyama, Benji},
abstractNote = {},
doi = {10.1063/1.5001479},
journal = {Applied Physics Letters},
number = 10,
volume = 111,
place = {United States},
year = {Mon Sep 04 00:00:00 EDT 2017},
month = {Mon Sep 04 00:00:00 EDT 2017}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on September 5, 2018
Publisher's Accepted Manuscript

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