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Title: Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing

Abstract

Herein we have investigated the domain width distributions of block copolymers and their ternary blends after directed assembly on chemically patterned surfaces with and without density multiplication. On chemical patterns with density multiplication, the width of the interpolated block copolymer domains was bimodal. Once blended with the corresponding homopolymers, the block copolymers exhibited unimodal distributions of domain width due to the redistribution of homopolymers in the block copolymer domains. When the block copolymers were blended with hydroxyl-terminated homopolymers, the homopolymers with functional end-groups healed the chemical patterns and facilitated the formation of nanostructures with further improved domain width distributions. Lastly, it is demonstrated that the block copolymers achieved the most improved domain width distributions when directed to assemble without density multiplication on one-to-one chemical patterns generated by molecular transfer printing.

Authors:
ORCiD logo;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
National Science Foundation (NSF); USDOE Office of Science - Office of Basic Energy Sciences - Materials Sciences and Engineering Division
OSTI Identifier:
1375810
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article
Resource Relation:
Journal Name: Polymer; Journal Volume: 116; Journal Issue: C
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Block copolymer; Chemical pattern; Directed assembly

Citation Formats

Liu, Guoliang, and Nealey, Paul F. Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing. United States: N. p., 2017. Web. doi:10.1016/j.polymer.2017.03.049.
Liu, Guoliang, & Nealey, Paul F. Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing. United States. doi:10.1016/j.polymer.2017.03.049.
Liu, Guoliang, and Nealey, Paul F. Mon . "Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing". United States. doi:10.1016/j.polymer.2017.03.049.
@article{osti_1375810,
title = {Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing},
author = {Liu, Guoliang and Nealey, Paul F.},
abstractNote = {Herein we have investigated the domain width distributions of block copolymers and their ternary blends after directed assembly on chemically patterned surfaces with and without density multiplication. On chemical patterns with density multiplication, the width of the interpolated block copolymer domains was bimodal. Once blended with the corresponding homopolymers, the block copolymers exhibited unimodal distributions of domain width due to the redistribution of homopolymers in the block copolymer domains. When the block copolymers were blended with hydroxyl-terminated homopolymers, the homopolymers with functional end-groups healed the chemical patterns and facilitated the formation of nanostructures with further improved domain width distributions. Lastly, it is demonstrated that the block copolymers achieved the most improved domain width distributions when directed to assemble without density multiplication on one-to-one chemical patterns generated by molecular transfer printing.},
doi = {10.1016/j.polymer.2017.03.049},
journal = {Polymer},
number = C,
volume = 116,
place = {United States},
year = {Mon May 01 00:00:00 EDT 2017},
month = {Mon May 01 00:00:00 EDT 2017}
}