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Title: Power measurements and coupler optimization in inductive discharges

Journal Article · · Review of Scientific Instruments
DOI:https://doi.org/10.1063/1.4995810· OSTI ID:1474346
ORCiD logo [1];  [2]
  1. Univ. of Michigan, Ann Arbor, MI (United States). Electrical Engineering and Computer Science Dept.; USA and RF Plasma Consulting, Brookline, MA (United States)
  2. Plasma Sensors, Brookline, MA (United States)

The power absorbed by the plasma is one of the key parameters which defines processes in any plasma source. This power, however, can be very different from the power at the rf power source output or the coupler terminals, which has been used in many publications to characterize the plasma. This article describes how to find the power absorbed by the plasma and the power lost in the coupler and matcher network for inductively coupled plasmas. In addition, several practical coupler configurations to reduce the coupler coil loss and minimize the rf plasma potential are discussed. Here, we propose an effective and simple method to achieve that by the coupler coil splitting and insertion of the resonating capacitor in the middle of the coil. Our experimental data demonstrate this approach having superior coupler efficiency and substantially lower rf plasma potential.

Research Organization:
Univ. of Michigan, Ann Arbor, MI (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Fusion Energy Sciences (FES)
Grant/Contract Number:
SC0001939
OSTI ID:
1474346
Alternate ID(s):
OSTI ID: 1375662
Journal Information:
Review of Scientific Instruments, Vol. 88, Issue 8; ISSN 0034-6748
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 5 works
Citation information provided by
Web of Science

References (12)

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Electrical and plasma parameters of ICP with high coupling efficiency journal February 2011
Radio frequency matching for helicon plasma sources
  • Rayner, J. P.; Cheetham, A. D.; French, G. N.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 14, Issue 4 https://doi.org/10.1116/1.580080
journal July 1996
Reduced electron temperature in a magnetized inductively-coupled plasma with internal coil journal October 2013
Dynamic plasma behaviour excited by m=+or-1 helicon wave journal September 1995
Plasma and electrical characteristics of inductive discharge in a magnetic field journal July 2004
Probe measurements of electron-energy distributions in plasmas: what can we measure and how can we achieve reliable results? journal May 2011
Experimental setup and electrical characteristics of an inductively coupled plasma journal January 1999
A simple analysis of an inductive RF discharge journal August 1992
Ferromagnetic enhanced inductive plasma sources journal June 2013
Miniaturization of inductively coupled plasma sources journal January 1999
Probe measurements of electron-energy distributions in plasmas: what can we measure and how can we achieve reliable results? journal June 2011

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Investigation of the power transfer efficiency in a radio-frequency driven negative hydrogen ion source journal May 2019

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