Highly doped layer for tunnel junctions in solar cells
Patent
·
OSTI ID:1373704
A highly doped layer for interconnecting tunnel junctions in multijunction solar cells is presented. The highly doped layer is a delta doped layer in one or both layers of a tunnel diode junction used to connect two or more p-on-n or n-on-p solar cells in a multijunction solar cell. A delta doped layer is made by interrupting the epitaxial growth of one of the layers of the tunnel diode, depositing a delta dopant at a concentration substantially greater than the concentration used in growing the layer of the tunnel diode, and then continuing to epitaxially grow the remaining tunnel diode.
- Research Organization:
- THE BOEING COMPANY, Chicago, IL (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FC36-07GO17052
- Assignee:
- THE BOEING COMPANY
- Patent Number(s):
- 9,722,131
- Application Number:
- 12/404,795
- OSTI ID:
- 1373704
- Resource Relation:
- Patent File Date: 2009 Mar 16
- Country of Publication:
- United States
- Language:
- English
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