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Title: Highly doped layer for tunnel junctions in solar cells

Patent ·
OSTI ID:1373704

A highly doped layer for interconnecting tunnel junctions in multijunction solar cells is presented. The highly doped layer is a delta doped layer in one or both layers of a tunnel diode junction used to connect two or more p-on-n or n-on-p solar cells in a multijunction solar cell. A delta doped layer is made by interrupting the epitaxial growth of one of the layers of the tunnel diode, depositing a delta dopant at a concentration substantially greater than the concentration used in growing the layer of the tunnel diode, and then continuing to epitaxially grow the remaining tunnel diode.

Research Organization:
THE BOEING COMPANY, Chicago, IL (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FC36-07GO17052
Assignee:
THE BOEING COMPANY
Patent Number(s):
9,722,131
Application Number:
12/404,795
OSTI ID:
1373704
Resource Relation:
Patent File Date: 2009 Mar 16
Country of Publication:
United States
Language:
English

References (8)

Heterojunction solar cell patent August 1994
Multijunction photovoltaic cell with thin 1st (top) subcell and thick 2nd subcell of same or similar semiconductor material patent November 2001
Group III-V solar cell patent-application July 2003
Ultrathin delta doped GaAs and AlAs tunnel junctions as interdevice ohmic contacts journal September 1993
Growth and electrical characterization of Si delta‐doped GaInP by low pressure metalorganic chemical vapor deposition journal May 1996
AlGaAs/GaInP heterojunction tunnel diode for cascade solar cell application journal August 1993
Application of δ-doping in GaAs tunnel junctions journal January 1994
Multi-junction III–V solar cells: current status and future potential journal July 2005

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