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Title: Fabrication and efficiency measurement of a Mo/C/Si/C three material system multilayer Laue lens

Abstract

In this letter we report on the manufacturing of a multilayer Laue lens (MLL) consisting of a multilayer stack with three materials: molybdenum and silicon as absorber and spacer layer, respectively, and carbon as transition layers. The design has four layers per period: Mo/C/Si/C. It yields 6000 zones, and provides an aperture of 50 μm. This allows the MLL structure to accept a large portion of the coherent part of the beam and achieving a small spot size. The MLL deposition was made by magnetron sputtering at the Fraunhofer IWS, the sectioning was done by laser cutting and subsequent focused ion beam milling to a thickness that provides a good efficiency for a photon energy of 12 keV. The diffraction efficiency as a function of the tilting angle has been measured at beamline 1-BM of the Advanced Photon Source. An efficiency of almost 40% has been achieved. This shows that the material system performs well compared to MLLs made of two-materials and that it is in an excellent agreement with the numerically calculated efficiency for a comparable molybdenum/silicon bilayer system lens. Here, we conclude that the three material system offers high efficiencies and is advantageous for stress reduction in MLLs.

Authors:
ORCiD logo [1];  [2]; ORCiD logo [3];  [1];  [1];  [1];  [1];  [2]
  1. Fraunhofer IWS Dresden, Dresden (Germany)
  2. Argonne National Lab. (ANL), Argonne, IL (United States)
  3. Leibniz-Institut fur Polymerforschung Dresden e.V., Dresden (Germany)
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1372402
Alternate Identifier(s):
OSTI ID: 1348039
Grant/Contract Number:
AC02-06CH11357
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 110; Journal Issue: 11; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Kubec, Adam, Maser, J., Formanek, P., Franke, V., Braun, S., Gawlitza, P., Leson, A., and Macrander, A.. Fabrication and efficiency measurement of a Mo/C/Si/C three material system multilayer Laue lens. United States: N. p., 2017. Web. doi:10.1063/1.4978610.
Kubec, Adam, Maser, J., Formanek, P., Franke, V., Braun, S., Gawlitza, P., Leson, A., & Macrander, A.. Fabrication and efficiency measurement of a Mo/C/Si/C three material system multilayer Laue lens. United States. doi:10.1063/1.4978610.
Kubec, Adam, Maser, J., Formanek, P., Franke, V., Braun, S., Gawlitza, P., Leson, A., and Macrander, A.. Fri . "Fabrication and efficiency measurement of a Mo/C/Si/C three material system multilayer Laue lens". United States. doi:10.1063/1.4978610. https://www.osti.gov/servlets/purl/1372402.
@article{osti_1372402,
title = {Fabrication and efficiency measurement of a Mo/C/Si/C three material system multilayer Laue lens},
author = {Kubec, Adam and Maser, J. and Formanek, P. and Franke, V. and Braun, S. and Gawlitza, P. and Leson, A. and Macrander, A.},
abstractNote = {In this letter we report on the manufacturing of a multilayer Laue lens (MLL) consisting of a multilayer stack with three materials: molybdenum and silicon as absorber and spacer layer, respectively, and carbon as transition layers. The design has four layers per period: Mo/C/Si/C. It yields 6000 zones, and provides an aperture of 50 μm. This allows the MLL structure to accept a large portion of the coherent part of the beam and achieving a small spot size. The MLL deposition was made by magnetron sputtering at the Fraunhofer IWS, the sectioning was done by laser cutting and subsequent focused ion beam milling to a thickness that provides a good efficiency for a photon energy of 12 keV. The diffraction efficiency as a function of the tilting angle has been measured at beamline 1-BM of the Advanced Photon Source. An efficiency of almost 40% has been achieved. This shows that the material system performs well compared to MLLs made of two-materials and that it is in an excellent agreement with the numerically calculated efficiency for a comparable molybdenum/silicon bilayer system lens. Here, we conclude that the three material system offers high efficiencies and is advantageous for stress reduction in MLLs.},
doi = {10.1063/1.4978610},
journal = {Applied Physics Letters},
number = 11,
volume = 110,
place = {United States},
year = {Fri Mar 17 00:00:00 EDT 2017},
month = {Fri Mar 17 00:00:00 EDT 2017}
}

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  • Cited by 1
  • A multilayer-Laue-lens (MLL) comprised of WSi{sub 2}/Al layers stacked to a full thickness of 102 μm was characterized for its diffraction efficiency and dynamical diffraction properties by x-ray measurements made in the far field. The achieved aperture roughly doubles the previous maximum reported aperture for an MLL, thereby doubling the working distance. Negative and positive first orders were found to have 14.2% and 13.0% efficiencies, respectively. A section thickness of 9.6 μm was determined from Laue-case thickness fringes in the diffraction data. A background gas consisting of 90% Ar and 10% N{sub 2} was used for sputtering. This material system wasmore » chosen to reduce grown-in stress as the multilayer is deposited. Although some regions of the full MLL exhibited defects, the presently reported results were obtained for a region devoid of defects. The data compare well to dynamical diffraction calculations with Coupled Wave Theory (CWT) which provided confirmation of the optical constants and densities assumed for the CWT calculations.« less
  • Cited by 8
  • A multilayer-Laue-lens (MLL) comprised of WSi 2/Al layers stacked to a full thickness of 102 microns was characterized for its diffraction efficiency and dynamical diffraction properties by x-ray measurements made in the far field. The achieved aperture roughly doubles the previous maximum reported aperture for an MLL, thereby doubling the working distance. Negative and positive first orders were found to have 14.2 % and 13.0 % efficiencies, respectively. A section thickness of 9.6 μm was determined from Laue-case thickness fringes in the diffraction data. A background gas consisting of 90 % Ar and 10 % N 2 was used formore » sputtering. This material system was chosen to reduce grown-in stress as the multilayer is deposited. Although some regions of the full MLL exhibited defects, the presently reported results were obtained for a region devoid of defects. The data compare well to dynamical diffraction calculations with Coupled Wave Theory (CWT) which provided confirmation of the optical constants and densities assumed for the CWT calculations.« less