Silicone elastomers capable of large isotropic dimensional change
Abstract
Described herein is a highly effective route towards the controlled and isotropic reduction in size-scale, of complex 3D structures using silicone network polymer chemistry. In particular, a class of silicone structures were developed that once patterned and cured can `shrink` micron scale additive manufactured and lithographically patterned structures by as much as 1 order of magnitude while preserving the dimensions and integrity of these parts. This class of silicone materials is compatible with existing additive manufacture and soft lithographic fabrication processes and will allow access to a hitherto unobtainable dimensionality of fabrication.
- Inventors:
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1371931
- Patent Number(s):
- 9,708,451
- Application Number:
- 14/189,964
- Assignee:
- Lawrence Livermore National Security, LLC
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Feb 25
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
Citation Formats
Lewicki, James, and Worsley, Marcus A. Silicone elastomers capable of large isotropic dimensional change. United States: N. p., 2017.
Web.
Lewicki, James, & Worsley, Marcus A. Silicone elastomers capable of large isotropic dimensional change. United States.
Lewicki, James, and Worsley, Marcus A. Tue .
"Silicone elastomers capable of large isotropic dimensional change". United States. https://www.osti.gov/servlets/purl/1371931.
@article{osti_1371931,
title = {Silicone elastomers capable of large isotropic dimensional change},
author = {Lewicki, James and Worsley, Marcus A.},
abstractNote = {Described herein is a highly effective route towards the controlled and isotropic reduction in size-scale, of complex 3D structures using silicone network polymer chemistry. In particular, a class of silicone structures were developed that once patterned and cured can `shrink` micron scale additive manufactured and lithographically patterned structures by as much as 1 order of magnitude while preserving the dimensions and integrity of these parts. This class of silicone materials is compatible with existing additive manufacture and soft lithographic fabrication processes and will allow access to a hitherto unobtainable dimensionality of fabrication.},
doi = {},
url = {https://www.osti.gov/biblio/1371931},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {7}
}
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