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Title: Atomic layer deposition in nanostructured photovoltaics: tuning optical, electronic and surface properties

Journal Article · · Nanoscale
DOI:https://doi.org/10.1039/C5NR02080H· OSTI ID:1370690

This review highlights applications of atomic layer deposition for third generation photovoltaics, including light absorption, barrier layer formation and passivation.

Research Organization:
Energy Frontier Research Centers (EFRC) (United States). Center on Nanostructuring for Efficient Energy Conversion (CNEEC)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
SC0001060
OSTI ID:
1370690
Journal Information:
Nanoscale, Vol. 7, Issue 29; Related Information: CNEEC partners with Stanford University (lead); Carnegie Institution at Stanford; Technical University of Denmark; ISSN 2040-3364
Publisher:
Royal Society of ChemistryCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 60 works
Citation information provided by
Web of Science

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Recent Progress in Photoelectrochemical Water Splitting Activity of WO3 Photoanodes journal April 2018
23.6%-efficient monolithic perovskite/silicon tandem solar cells with improved stability journal February 2017
Tuning band alignment by CdS layers using a SILAR method to enhance TiO 2 /CdS/CdSe quantum-dot solar-cell performance journal January 2016
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Progress in Powder Coating Technology Using Atomic Layer Deposition journal November 2018