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Title: Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics

Abstract

Ultra-thin (0.5–10 nm) plasma-enhanced atomic layer deposited titanium oxide (TiO x) films deposited on indium-tin-oxide contacts, are investigated as hole-blocking interlayers using conventional electrochemistry, Si-diodes, and heterojunction (P3HT:PCBM) organic photovoltaics (OPVs).

Authors:
 [1];  [2];  [2];  [3];  [3];  [4];  [4];  [2];  [5]
  1. School of Mechanical Engineering; Georgia Institute of Technology; Atlanta, USA
  2. Department of Chemistry & Biochemistry; University of Arizona; Tucson, USA
  3. National Renewable Energy Laboratory (NREL); Golden, USA
  4. Institut d'Electronique, de Microélectronique et de Nanotechnologie (IEMN); Le Centre National de la Recherche Scientifique (CNRS); Villeneuve d'Ascq, France
  5. School of Mechanical Engineering; Georgia Institute of Technology; Atlanta, USA; School of Materials Science and Engineering; Center for Organic Photonics and Electronics
Publication Date:
Research Org.:
Energy Frontier Research Centers (EFRC) (United States). Center for Interface Science: Solar Electric Materials (CISSEM)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1370575
DOE Contract Number:  
SC0001084
Resource Type:
Journal Article
Journal Name:
Journal of Materials Chemistry. A
Additional Journal Information:
Journal Volume: 3; Journal Issue: 33; Related Information: CISSEM partners with the University of Arizona (lead); Georgia Institute of Technology; National Renewable Energy Laboratory; Princeton University; University of Washington; Journal ID: ISSN 2050-7488
Publisher:
Royal Society of Chemistry
Country of Publication:
United States
Language:
English
Subject:
solar (photovoltaic), electrodes - solar, charge transport, synthesis (novel materials), synthesis (self-assembly), synthesis (scalable processing)

Citation Formats

Kim, Hyungchul, Ou, Kai-Lin, Wu, Xin, Ndione, Paul F., Berry, Joseph, Lambert, Yannick, Mélin, Thierry, Armstrong, Neal R., and Graham, Samuel. Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics. United States: N. p., 2015. Web. doi:10.1039/C5TA04687D.
Kim, Hyungchul, Ou, Kai-Lin, Wu, Xin, Ndione, Paul F., Berry, Joseph, Lambert, Yannick, Mélin, Thierry, Armstrong, Neal R., & Graham, Samuel. Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics. United States. doi:10.1039/C5TA04687D.
Kim, Hyungchul, Ou, Kai-Lin, Wu, Xin, Ndione, Paul F., Berry, Joseph, Lambert, Yannick, Mélin, Thierry, Armstrong, Neal R., and Graham, Samuel. Thu . "Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics". United States. doi:10.1039/C5TA04687D.
@article{osti_1370575,
title = {Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics},
author = {Kim, Hyungchul and Ou, Kai-Lin and Wu, Xin and Ndione, Paul F. and Berry, Joseph and Lambert, Yannick and Mélin, Thierry and Armstrong, Neal R. and Graham, Samuel},
abstractNote = {Ultra-thin (0.5–10 nm) plasma-enhanced atomic layer deposited titanium oxide (TiOx) films deposited on indium-tin-oxide contacts, are investigated as hole-blocking interlayers using conventional electrochemistry, Si-diodes, and heterojunction (P3HT:PCBM) organic photovoltaics (OPVs).},
doi = {10.1039/C5TA04687D},
journal = {Journal of Materials Chemistry. A},
issn = {2050-7488},
number = 33,
volume = 3,
place = {United States},
year = {2015},
month = {1}
}

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