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Title: Highly Anisotropic Crystallographic Etching for Fabrication of High-Aspect Ratio GaN Nanostructures.

Abstract

Abstract not provided.

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1369519
Report Number(s):
SAND2016-6423C
643970
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the 18th International Conference on Metal Organic Vapor Phase Epitaxy held July 10-15, 2016 in San Diego, CA.
Country of Publication:
United States
Language:
English

Citation Formats

Leung, Benjamin, Tsai, Miao-Chan, Balakrishnan, Ganesh, Li, Changyi, Brueck, Steven R. J., Figiel, Jeffrey J., Lu, Ping, and Wang, George T. Highly Anisotropic Crystallographic Etching for Fabrication of High-Aspect Ratio GaN Nanostructures.. United States: N. p., 2016. Web.
Leung, Benjamin, Tsai, Miao-Chan, Balakrishnan, Ganesh, Li, Changyi, Brueck, Steven R. J., Figiel, Jeffrey J., Lu, Ping, & Wang, George T. Highly Anisotropic Crystallographic Etching for Fabrication of High-Aspect Ratio GaN Nanostructures.. United States.
Leung, Benjamin, Tsai, Miao-Chan, Balakrishnan, Ganesh, Li, Changyi, Brueck, Steven R. J., Figiel, Jeffrey J., Lu, Ping, and Wang, George T. Fri . "Highly Anisotropic Crystallographic Etching for Fabrication of High-Aspect Ratio GaN Nanostructures.". United States. doi:. https://www.osti.gov/servlets/purl/1369519.
@article{osti_1369519,
title = {Highly Anisotropic Crystallographic Etching for Fabrication of High-Aspect Ratio GaN Nanostructures.},
author = {Leung, Benjamin and Tsai, Miao-Chan and Balakrishnan, Ganesh and Li, Changyi and Brueck, Steven R. J. and Figiel, Jeffrey J. and Lu, Ping and Wang, George T.},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jul 01 00:00:00 EDT 2016},
month = {Fri Jul 01 00:00:00 EDT 2016}
}

Conference:
Other availability
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