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Title: Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly

Authors:
 [1];  [2];  [3];  [4]
  1. Materials Research Laboratory, University of California, Santa Barbara California 93106; Materials Department, University of California, Santa Barbara California 93106
  2. Materials Research Laboratory, University of California, Santa Barbara California 93106; Department of Chemical Engineering, University of California, Santa Barbara California 93106; Materials Department, University of California, Santa Barbara California 93106
  3. Materials Research Laboratory, University of California, Santa Barbara California 93106; Materials Department, University of California, Santa Barbara California 93106; Department of Chemistry and Biochemistry, University of California, Santa Barbara California 93106
  4. Materials Research Laboratory, University of California, Santa Barbara California 93106; McKetta Department of Chemical Engineering, University of Texas at Austin, Austin Texas 78712
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
NSFUNIVERSITY
OSTI Identifier:
1368328
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Polymer Science. Part B, Polymer Physics; Journal Volume: 55; Journal Issue: 15
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Stahl, Brian C., Kramer, Edward J., Hawker, Craig J., and Lynd, Nathaniel A.. Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly. United States: N. p., 2017. Web. doi:10.1002/polb.24366.
Stahl, Brian C., Kramer, Edward J., Hawker, Craig J., & Lynd, Nathaniel A.. Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly. United States. doi:10.1002/polb.24366.
Stahl, Brian C., Kramer, Edward J., Hawker, Craig J., and Lynd, Nathaniel A.. Fri . "Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly". United States. doi:10.1002/polb.24366.
@article{osti_1368328,
title = {Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly},
author = {Stahl, Brian C. and Kramer, Edward J. and Hawker, Craig J. and Lynd, Nathaniel A.},
abstractNote = {},
doi = {10.1002/polb.24366},
journal = {Journal of Polymer Science. Part B, Polymer Physics},
number = 15,
volume = 55,
place = {United States},
year = {Fri May 05 00:00:00 EDT 2017},
month = {Fri May 05 00:00:00 EDT 2017}
}