skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly

Authors:
 [1];  [2];  [3];  [4]
  1. Materials Research Laboratory, University of California, Santa Barbara California 93106; Materials Department, University of California, Santa Barbara California 93106
  2. Materials Research Laboratory, University of California, Santa Barbara California 93106; Department of Chemical Engineering, University of California, Santa Barbara California 93106; Materials Department, University of California, Santa Barbara California 93106
  3. Materials Research Laboratory, University of California, Santa Barbara California 93106; Materials Department, University of California, Santa Barbara California 93106; Department of Chemistry and Biochemistry, University of California, Santa Barbara California 93106
  4. Materials Research Laboratory, University of California, Santa Barbara California 93106; McKetta Department of Chemical Engineering, University of Texas at Austin, Austin Texas 78712
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
NSFUNIVERSITY
OSTI Identifier:
1368328
Resource Type:
Journal Article
Journal Name:
Journal of Polymer Science. Part B, Polymer Physics
Additional Journal Information:
Journal Volume: 55; Journal Issue: 15; Journal ID: ISSN 0887-6266
Publisher:
Wiley
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Stahl, Brian C., Kramer, Edward J., Hawker, Craig J., and Lynd, Nathaniel A. Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly. United States: N. p., 2017. Web. doi:10.1002/polb.24366.
Stahl, Brian C., Kramer, Edward J., Hawker, Craig J., & Lynd, Nathaniel A. Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly. United States. doi:10.1002/polb.24366.
Stahl, Brian C., Kramer, Edward J., Hawker, Craig J., and Lynd, Nathaniel A. Fri . "Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly". United States. doi:10.1002/polb.24366.
@article{osti_1368328,
title = {Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly},
author = {Stahl, Brian C. and Kramer, Edward J. and Hawker, Craig J. and Lynd, Nathaniel A.},
abstractNote = {},
doi = {10.1002/polb.24366},
journal = {Journal of Polymer Science. Part B, Polymer Physics},
issn = {0887-6266},
number = 15,
volume = 55,
place = {United States},
year = {2017},
month = {5}
}

Works referenced in this record:

Solvent Annealed Thin Films of Asymmetric Polyisoprene−Polylactide Diblock Copolymers
journal, February 2007

  • Cavicchi, Kevin A.; Russell, Thomas P.
  • Macromolecules, Vol. 40, Issue 4
  • DOI: 10.1021/ma061163w

Defect-Free Nanoporous Thin Films from ABC Triblock Copolymers
journal, June 2006

  • Bang, Joona; Kim, Seung Hyun; Drockenmuller, Eric
  • Journal of the American Chemical Society, Vol. 128, Issue 23
  • DOI: 10.1021/ja0608141

Highly Ordered Nanoporous Thin Films from Cleavable Polystyrene-block-poly(ethylene oxide)
journal, June 2007


Single-Crystal Diffraction from Two-Dimensional Block Copolymer Arrays
journal, February 2007


Morphology Control in Block Copolymer Films Using Mixed Solvent Vapors
journal, August 2012

  • Gotrik, Kevin W.; Hannon, Adam F.; Son, Jeong Gon
  • ACS Nano, Vol. 6, Issue 9
  • DOI: 10.1021/nn302641z

Lateral Ordering of Cylindrical Microdomains Under Solvent Vapor
journal, February 2009

  • Park, Soojin; Kim, Bokyung; Xu, Ji
  • Macromolecules, Vol. 42, Issue 4
  • DOI: 10.1021/ma802480s

Solvent annealing thin films of poly(isoprene-b-lactide)
journal, November 2005


Phase behavior in thin films of cylinder-forming ABA block copolymers: Experiments
journal, January 2004

  • Knoll, Armin; Magerle, Robert; Krausch, Georg
  • The Journal of Chemical Physics, Vol. 120, Issue 2
  • DOI: 10.1063/1.1627324

Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries
journal, October 2007

  • Stoykovich, Mark P.; Kang, Huiman; Daoulas, Kostas Ch.
  • ACS Nano, Vol. 1, Issue 3
  • DOI: 10.1021/nn700164p

Phase transition behavior in thin films of block copolymers by use of immiscible solvent vapors
journal, January 2011

  • Kim, Bokyung; Hong, Sung Woo; Park, Soojin
  • Soft Matter, Vol. 7, Issue 2, p. 443-447
  • DOI: 10.1039/C0SM00422G

Layering Transitions in Thin Films of Spherical-Domain Block Copolymers
journal, April 2007

  • Stein, Gila E.; Kramer, Edward J.; Li, Xuefa
  • Macromolecules, Vol. 40, Issue 7
  • DOI: 10.1021/ma0625509

Phase Behavior in Thin Films of Cylinder-Forming Block Copolymers
journal, June 2002


Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication
journal, July 2001

  • Black, C. T.; Guarini, K. W.; Milkove, K. R.
  • Applied Physics Letters, Vol. 79, Issue 3, p. 409-411
  • DOI: 10.1063/1.1383805

Graphoepitaxy of Spherical Domain Block Copolymer Films
journal, August 2001


Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns
journal, June 2009


Block Copolymer Lithography: Periodic Arrays of 1011 Holes in 1 Square Centimeter
journal, May 1997


Large-Scale Alignment of ABC Block Copolymer Microdomains via Solvent Vapor Treatment
journal, February 2000

  • Fukunaga, Kenji; Elbs, Hubert; Magerle, Robert
  • Macromolecules, Vol. 33, Issue 3, p. 947-953
  • DOI: 10.1021/ma9910639

Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation
journal, February 2004

  • Kim, S. H.; Misner, M. J.; Xu, T.
  • Advanced Materials, Vol. 16, Issue 3, p. 226-231
  • DOI: 10.1002/adma.200304906

Self-assembly of block copolymer thin films
journal, June 2010


Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays
journal, October 2008


Pattern coarsening in a 2D hexagonal system
journal, September 2004


Nanopatterning via Solvent Vapor Annealing of Block Copolymer Thin Films
journal, September 2016


The dedicated high-resolution grazing-incidence X-ray scattering beamline 8-ID-E at the Advanced Photon Source
journal, June 2012

  • Jiang, Zhang; Li, Xuefa; Strzalka, Joseph
  • Journal of Synchrotron Radiation, Vol. 19, Issue 4
  • DOI: 10.1107/S0909049512022017

Mechanisms of Ordering in Striped Patterns
journal, November 2000


Multiple Nanoscale Templates by Orthogonal Degradation of a Supramolecular Block Copolymer Lithographic System
journal, December 2009

  • Tang, Chuanbing; Sivanandan, Kulandaivelu; Stahl, Brian C.
  • ACS Nano, Vol. 4, Issue 1
  • DOI: 10.1021/nn901330q

Reversible Morphology Control in Block Copolymer Films via Solvent Vapor Processing: An in Situ GISAXS Study
journal, May 2010

  • Paik, Marvin Y.; Bosworth, Joan K.; Smilges, Detlef-M.
  • Macromolecules, Vol. 43, Issue 9
  • DOI: 10.1021/ma902646t

Nanoscale patterning using self-assembled polymers for semiconductor applications
journal, January 2001

  • Guarini, K. W.; Black, C. T.; Milkove, K. R.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 19, Issue 6, Article No. 2784
  • DOI: 10.1116/1.1421551