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Title: Pressure-induced elastic anomaly in a polyamorphous metallic glass

Authors:
ORCiD logo; ; ; ; ORCiD logo; ; ORCiD logo;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
DOE - BASIC ENERGY SCIENCESNSFDOE-NNSAFOREIGN
OSTI Identifier:
1368293
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 110; Journal Issue: 22
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Zeng, Qiaoshi, Zeng, Zhidan, Lou, Hongbo, Kono, Yoshio, Zhang, Bo, Kenney-Benson, Curtis, Park, Changyong, and Mao, Wendy L. Pressure-induced elastic anomaly in a polyamorphous metallic glass. United States: N. p., 2017. Web. doi:10.1063/1.4984746.
Zeng, Qiaoshi, Zeng, Zhidan, Lou, Hongbo, Kono, Yoshio, Zhang, Bo, Kenney-Benson, Curtis, Park, Changyong, & Mao, Wendy L. Pressure-induced elastic anomaly in a polyamorphous metallic glass. United States. doi:10.1063/1.4984746.
Zeng, Qiaoshi, Zeng, Zhidan, Lou, Hongbo, Kono, Yoshio, Zhang, Bo, Kenney-Benson, Curtis, Park, Changyong, and Mao, Wendy L. Mon . "Pressure-induced elastic anomaly in a polyamorphous metallic glass". United States. doi:10.1063/1.4984746.
@article{osti_1368293,
title = {Pressure-induced elastic anomaly in a polyamorphous metallic glass},
author = {Zeng, Qiaoshi and Zeng, Zhidan and Lou, Hongbo and Kono, Yoshio and Zhang, Bo and Kenney-Benson, Curtis and Park, Changyong and Mao, Wendy L.},
abstractNote = {},
doi = {10.1063/1.4984746},
journal = {Applied Physics Letters},
number = 22,
volume = 110,
place = {United States},
year = {Mon May 29 00:00:00 EDT 2017},
month = {Mon May 29 00:00:00 EDT 2017}
}
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  • The thermal stability and electronic transport properties of polyamorphous Ce{sub 75}Al{sub 25} metallic glass (MG) have been investigated using in situ high-pressure, high-temperature, energy-dispersive synchrotron x-ray diffraction and in situ high-pressure and low-temperature, four-probe resistance measurements. The results are compared with the properties of La{sub 75}Al{sub 25} MG. The pressure dependence of the crystallization temperature and resistance of the Ce{sub 75}Al{sub 25} MG exhibited turning points at the polyamorphic transition pressure, 1.5 GPa, and they clearly presented different behaviors below and above 1.5 GPa. In contrast, no turning points were observed in the La{sub 75}Al{sub 25} MG (La has nomore » 4f electron). Additionally, the pressure-tuned temperature coefficient of resistance of the Ce{sub 75}Al{sub 25} MG was observed. These results revealed switchable properties in the polyamorphous Ce{sub 75}Al{sub 25} MG that are linked with 4f electron delocalization.« less