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Title: High power RF window deposition apparatus, method, and device

Abstract

A process for forming a coating for an RF window which has improved secondary electron emission and reduced multipactor for high power RF waveguides is formed from a substrate with low loss tangent and desirable mechanical characteristics. The substrate has an RPAO deposition layer applied which oxygenates the surface of the substrate to remove carbon impurities, thereafter has an RPAN deposition layer applied to nitrogen activate the surface of the substrate, after which a TiN deposition layer is applied using Titanium tert-butoxide. The TiN deposition layer is capped with a final RPAN deposition layer of nitridation to reduce the bound oxygen in the TiN deposition layer. The resulting RF window has greatly improved titanium layer adhesion, reduced multipactor, and is able to withstand greater RF power levels than provided by the prior art.

Inventors:
; ;
Publication Date:
Research Org.:
Calabazas Creek Research, Inc. San Mateo, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1368189
Patent Number(s):
9,698,454
Application Number:
13/937,216
Assignee:
Calabazas Creek Research, Inc. CHO
DOE Contract Number:  
SC0004571
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Jul 09
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Ives, Lawrence R., Lucovsky, Gerald, and Zeller, Daniel. High power RF window deposition apparatus, method, and device. United States: N. p., 2017. Web.
Ives, Lawrence R., Lucovsky, Gerald, & Zeller, Daniel. High power RF window deposition apparatus, method, and device. United States.
Ives, Lawrence R., Lucovsky, Gerald, and Zeller, Daniel. Tue . "High power RF window deposition apparatus, method, and device". United States. https://www.osti.gov/servlets/purl/1368189.
@article{osti_1368189,
title = {High power RF window deposition apparatus, method, and device},
author = {Ives, Lawrence R. and Lucovsky, Gerald and Zeller, Daniel},
abstractNote = {A process for forming a coating for an RF window which has improved secondary electron emission and reduced multipactor for high power RF waveguides is formed from a substrate with low loss tangent and desirable mechanical characteristics. The substrate has an RPAO deposition layer applied which oxygenates the surface of the substrate to remove carbon impurities, thereafter has an RPAN deposition layer applied to nitrogen activate the surface of the substrate, after which a TiN deposition layer is applied using Titanium tert-butoxide. The TiN deposition layer is capped with a final RPAN deposition layer of nitridation to reduce the bound oxygen in the TiN deposition layer. The resulting RF window has greatly improved titanium layer adhesion, reduced multipactor, and is able to withstand greater RF power levels than provided by the prior art.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {7}
}

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